Characterization of Free-Standing Nano-Membranes by Using Ellipsometry

The thickness of the pellicle is only a few tens of microns in extreme ultraviolet lithography (EUVL). This is because the absorption loss by the pellicle is high. Thus, the thickness and contamination on the surface of the EUVL pellicle are important factors for controlling the transmission of EUV...

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Bibliographic Details
Published in:Journal of the Korean Physical Society 2018, 72(8), , pp.868-872
Main Authors: Park, Sungmo, Lee, Changho, An, Ilsin, Kim, Min-Su, Park, Jin-Goo, Ahn, Jin-ho
Format: Article
Language:English
Subjects:
Mathematical and Computational Physics
Membranes
Particle and Nuclear Physics
Pellicle
Physics
Physics and Astronomy
Spectroellipsometry
Theoretical
Vibration measurement
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Summary:The thickness of the pellicle is only a few tens of microns in extreme ultraviolet lithography (EUVL). This is because the absorption loss by the pellicle is high. Thus, the thickness and contamination on the surface of the EUVL pellicle are important factors for controlling the transmission of EUV light. In this work, we fabricate ultra-thin silicon-nitride membranes for EUVL pellicles and use micro-spot spectroscopic ellipsometry and imaging ellipsometry for characterization. We successfully deduce not only the thickness but also the optical function of the membrane. However, we found that some precautions were required for accurate measurement of the free-standing thin membranes by using ellipsometry. Issues related to the vibration of the membrane and the sensitivity of the measurement are discussed.
ISSN:0374-4884
1976-8524
DOI:10.3938/jkps.72.868