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Fabrication and electrochemical characteristics of crack-resistant si-based anode materials for all-solid-state thin-film batteries

A series of Si-Zr and Si-Zr-Ag films were prepared by the co-sputtering method to examine their microstructural stability and electrochemical performances. Si-Zr thin films like Si 58 Zr 42 and Si 48 Zr 52 , alloyed with significant proportions of Zr, show excellent cycle performance with no microst...

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Bibliographic Details
Published in:Electronic materials letters 2009, 5(1), , pp.13-17
Main Authors: Jeon, Bong-Seok, Lee, Sung-Man
Format: Article
Language:English
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Summary:A series of Si-Zr and Si-Zr-Ag films were prepared by the co-sputtering method to examine their microstructural stability and electrochemical performances. Si-Zr thin films like Si 58 Zr 42 and Si 48 Zr 52 , alloyed with significant proportions of Zr, show excellent cycle performance with no microstructural change to the film surfaces, although they exhibit a reduced reversible capacity. Si-Zr-Ag film shows a charge-discharge profile with a plateau-like region, in which the cycle performance and the morphological stability depend on film fabrication conditions such as the substrate and the applied bias voltage.
ISSN:1738-8090
2093-6788
DOI:10.3365/eml.2009.03.013