Transient responses of two-dimensional viscoelastic film casting processes to sinusoidal disturbances

The sensitivity of two-dimensional isothermal film casting processes to ongoing sinusoidal disturbances has been investigated by using the frequency response method with transient simulation techniques. Amplitude ratios of state variables such as cross-sectional area, film width and film thickness a...

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Bibliographic Details
Published in:The Korean journal of chemical engineering 2009, 26(1), 118, pp.26-31
Main Authors: Choi, Seung Won, Shin, Dong Myeong, Lee, Joo Sung, Kim, Ju Min, Jung, Hyun Wook, Hyun, Jae Chun
Format: Article
Language:English
Subjects:
Biotechnology
Catalysis
Chemistry
Chemistry and Materials Science
Industrial Chemistry/Chemical Engineering
Materials Science
Process Safety
Process Systems Engineering
Transport Phenomena
화학공학
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Summary:The sensitivity of two-dimensional isothermal film casting processes to ongoing sinusoidal disturbances has been investigated by using the frequency response method with transient simulation techniques. Amplitude ratios of state variables such as cross-sectional area, film width and film thickness at the take-up position with respect to a sinusoidal disturbance show resonant peaks along the frequency domain. Effects of operating conditions, such as drawdown ratio and aspect ratio, on the process sensitivity have been examined. Increasing drawdown ratio and decreasing aspect ratio make the system more sensitive to disturbances. Also, the dichotomous behavior in the sensitivity analysis using viscoelastic Phan-Thien and Tanner fluids has been elucidated. This frequency response method can be a useful tool to optimally design process systems for better processability and product quality.
ISSN:0256-1115
1975-7220
DOI:10.1007/s11814-009-0005-1