Influence of sputtering gas pressure on the LiCoO2 thin film cathode post-annealed at 400？oC

KCI Citation Count: 11

Saved in:
Bibliographic Details
Published in:The Korean journal of chemical engineering 2006, 23(5), 104, pp.832-837
Main Authors: 남상철, 박호영, Young Chang Lim, Kyu Gil Choi, Ki Chang Lee, Gi Back Park, Heesook Park Kim, Sung Baek Cho
Format: Article
Language:Korean
Subjects:
화학공학
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by
cites
container_end_page 837
container_issue
container_start_page 832
container_title The Korean journal of chemical engineering
container_volume
creator 남상철
박호영
Young Chang Lim
Kyu Gil Choi
Ki Chang Lee
Gi Back Park
Heesook Park Kim
Sung Baek Cho
description KCI Citation Count: 11
format article
fullrecord <record><control><sourceid>nrf</sourceid><recordid>TN_cdi_nrf_kci_oai_kci_go_kr_ARTI_799829</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>oai_kci_go_kr_ARTI_799829</sourcerecordid><originalsourceid>FETCH-nrf_kci_oai_kci_go_kr_ARTI_7998293</originalsourceid><addsrcrecordid>eNqViksKwjAUAIMoWD93eEs3hTSa1i6lKAqCIK4Nob600ZqUJD2PF_FOXkERL-BqBmZ6JEryjMcZY7RPIsp4GidJwodk5P2VUs5TRiNy3hnVdGhKBKvAt10I6LSpoJIeWofed-6TDIQaYa8Le2Af1QaUbu5QylDbC0JrfYilMSgbvIAMsKD09XzYYkIGSjYepz-OyWyzPhXb2DglbqUWVuovKytuTqyOp53I8nzJ8vkf6xs8PElR</addsrcrecordid><sourcetype>Open Website</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Influence of sputtering gas pressure on the LiCoO2 thin film cathode post-annealed at 400？oC</title><source>Springer Nature</source><creator>남상철 ; 박호영 ; Young Chang Lim ; Kyu Gil Choi ; Ki Chang Lee ; Gi Back Park ; Heesook Park Kim ; Sung Baek Cho</creator><creatorcontrib>남상철 ; 박호영 ; Young Chang Lim ; Kyu Gil Choi ; Ki Chang Lee ; Gi Back Park ; Heesook Park Kim ; Sung Baek Cho</creatorcontrib><description>KCI Citation Count: 11</description><identifier>ISSN: 0256-1115</identifier><identifier>EISSN: 1975-7220</identifier><language>kor</language><publisher>한국화학공학회</publisher><subject>화학공학</subject><ispartof>Korean Journal of Chemical Engineering, 2006, 23(5), 104, pp.832-837</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,777,781</link.rule.ids><backlink>$$Uhttps://www.kci.go.kr/kciportal/ci/sereArticleSearch/ciSereArtiView.kci?sereArticleSearchBean.artiId=ART001119032$$DAccess content in National Research Foundation of Korea (NRF)$$Hfree_for_read</backlink></links><search><creatorcontrib>남상철</creatorcontrib><creatorcontrib>박호영</creatorcontrib><creatorcontrib>Young Chang Lim</creatorcontrib><creatorcontrib>Kyu Gil Choi</creatorcontrib><creatorcontrib>Ki Chang Lee</creatorcontrib><creatorcontrib>Gi Back Park</creatorcontrib><creatorcontrib>Heesook Park Kim</creatorcontrib><creatorcontrib>Sung Baek Cho</creatorcontrib><title>Influence of sputtering gas pressure on the LiCoO2 thin film cathode post-annealed at 400？oC</title><title>The Korean journal of chemical engineering</title><description>KCI Citation Count: 11</description><subject>화학공학</subject><issn>0256-1115</issn><issn>1975-7220</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNqViksKwjAUAIMoWD93eEs3hTSa1i6lKAqCIK4Nob600ZqUJD2PF_FOXkERL-BqBmZ6JEryjMcZY7RPIsp4GidJwodk5P2VUs5TRiNy3hnVdGhKBKvAt10I6LSpoJIeWofed-6TDIQaYa8Le2Af1QaUbu5QylDbC0JrfYilMSgbvIAMsKD09XzYYkIGSjYepz-OyWyzPhXb2DglbqUWVuovKytuTqyOp53I8nzJ8vkf6xs8PElR</recordid><startdate>200609</startdate><enddate>200609</enddate><creator>남상철</creator><creator>박호영</creator><creator>Young Chang Lim</creator><creator>Kyu Gil Choi</creator><creator>Ki Chang Lee</creator><creator>Gi Back Park</creator><creator>Heesook Park Kim</creator><creator>Sung Baek Cho</creator><general>한국화학공학회</general><scope>ACYCR</scope></search><sort><creationdate>200609</creationdate><title>Influence of sputtering gas pressure on the LiCoO2 thin film cathode post-annealed at 400？oC</title><author>남상철 ; 박호영 ; Young Chang Lim ; Kyu Gil Choi ; Ki Chang Lee ; Gi Back Park ; Heesook Park Kim ; Sung Baek Cho</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-nrf_kci_oai_kci_go_kr_ARTI_7998293</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>kor</language><creationdate>2006</creationdate><topic>화학공학</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>남상철</creatorcontrib><creatorcontrib>박호영</creatorcontrib><creatorcontrib>Young Chang Lim</creatorcontrib><creatorcontrib>Kyu Gil Choi</creatorcontrib><creatorcontrib>Ki Chang Lee</creatorcontrib><creatorcontrib>Gi Back Park</creatorcontrib><creatorcontrib>Heesook Park Kim</creatorcontrib><creatorcontrib>Sung Baek Cho</creatorcontrib><collection>Korean Citation Index</collection><jtitle>The Korean journal of chemical engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>남상철</au><au>박호영</au><au>Young Chang Lim</au><au>Kyu Gil Choi</au><au>Ki Chang Lee</au><au>Gi Back Park</au><au>Heesook Park Kim</au><au>Sung Baek Cho</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Influence of sputtering gas pressure on the LiCoO2 thin film cathode post-annealed at 400？oC</atitle><jtitle>The Korean journal of chemical engineering</jtitle><date>2006-09</date><risdate>2006</risdate><spage>832</spage><epage>837</epage><pages>832-837</pages><issn>0256-1115</issn><eissn>1975-7220</eissn><abstract>KCI Citation Count: 11</abstract><pub>한국화학공학회</pub></addata></record>
fulltext fulltext
identifier ISSN: 0256-1115
ispartof Korean Journal of Chemical Engineering, 2006, 23(5), 104, pp.832-837
issn 0256-1115
1975-7220
language kor
recordid cdi_nrf_kci_oai_kci_go_kr_ARTI_799829
source Springer Nature
subjects 화학공학
title Influence of sputtering gas pressure on the LiCoO2 thin film cathode post-annealed at 400？oC
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T12%3A21%3A16IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-nrf&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Influence%20of%20sputtering%20gas%20pressure%20on%20the%20LiCoO2%20thin%20film%20cathode%20post-annealed%20at%20400%EF%BC%9FoC&rft.jtitle=The%20Korean%20journal%20of%20chemical%20engineering&rft.au=%EB%82%A8%EC%83%81%EC%B2%A0&rft.date=2006-09&rft.spage=832&rft.epage=837&rft.pages=832-837&rft.issn=0256-1115&rft.eissn=1975-7220&rft_id=info:doi/&rft_dat=%3Cnrf%3Eoai_kci_go_kr_ARTI_799829%3C/nrf%3E%3Cgrp_id%3Ecdi_FETCH-nrf_kci_oai_kci_go_kr_ARTI_7998293%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true