Analysis of SOHOS Flash Memory with 3-level Charge Pumping Method

This paper discusses the 3-level charge pumping (CP) method in planar-type Silicon-Oxide-High-k-Oxide-Silicon (SOHOS) and Silicon-Oxide-Nitride-Oxide-Silicon (SONOS) devices to find out the reason of the degradation of data retention properties. In the CP technique, pulses are applied to the gate of...

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Bibliographic Details
Published in:Journal of semiconductor technology and science 2014, 14(1), 55, pp.34-39
Main Authors: Yang, Seung-Dong, Kim, Seong-Hyeon, Yun, Ho-Jin, Jeong, Kwang-Seok, Kim, Yu-Mi, Kim, Jin-Seop, Ko, Young-Uk, An, Jin-Un, Lee, Hi-Deok, Lee, Ga-Won
Format: Article
Language:English
Subjects:
전기공학
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Summary:This paper discusses the 3-level charge pumping (CP) method in planar-type Silicon-Oxide-High-k-Oxide-Silicon (SOHOS) and Silicon-Oxide-Nitride-Oxide-Silicon (SONOS) devices to find out the reason of the degradation of data retention properties. In the CP technique, pulses are applied to the gate of the MOSFET which alternately fill the traps with electrons and holes, thereby causing a recombination current Icp to flow in the substrate. The 3-level charge pumping method may be used to determine not only interface trap densities but also capture cross sections as a function of trap energy. By applying this method, SOHOS device found to have a higher interface trap density than SONOS device. Therefore, degradation of data retention characteristics is attributed to the many interface trap sites. KCI Citation Count: 1
ISSN:1598-1657
2233-4866
DOI:10.5573/JSTS.2014.14.1.034