Measurement of Film Thickness by Double-slit Experiment

We show that a simple double-slit experimental setup can be used to measure the thickness of a trans-parent thin film. The phase difference between the light passing through one slit covered with photore-sist film and that passing through the other slit without film was estimated using the simple Fr...

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Bibliographic Details
Published in:Current optics and photonics 2021, 5(1), , pp.52-58
Main Authors: Park, Soobong, Kim, Byoung Joo, Kim, Deok Woo, Cha, Myoungsik
Format: Article
Language:English
Subjects:
Film thickness
Thickness measurement
Thin films
물리학
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Description
Summary:We show that a simple double-slit experimental setup can be used to measure the thickness of a trans-parent thin film. The phase difference between the light passing through one slit covered with photore-sist film and that passing through the other slit without film was estimated using the simple Fraunhofer diffraction formula for a double slit. Our method gave error of a few percent or less for film thicknesses ranging from 0.7 to 1.7 μm, demonstrating that a laboratory double-slit experimental setup can be uti-lized in practical film-thickness measurements.
ISSN:2508-7266
2508-7274
DOI:10.3807/COPP.2021.5.1.052