Short focal length Kirkpatrick-Baez mirrors for a hard x-ray nanoprobe

We describe progress in the fabrication of short-focal-length total-external-reflection Kirkpatrick-Baez x-ray mirrors with ultralow figure errors. The short focal length optics produce nanoscale beams ( < 100 nm ) on conventional ( ∼ 64 m long) beamlines at third generation synchrotron sources....

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Bibliographic Details
Published in:Review of scientific instruments 2005-11, Vol.76 (11), p.113701-113701-6
Main Authors: Liu, Wenjun, Ice, Gene E., Tischler, Jonathan Z., Khounsary, Ali, Liu, Chian, Assoufid, Lahsen, Macrander, Albert T.
Format: Article
Language:English
Subjects:
ADVANCED PHOTON SOURCE
COATINGS
COMPUTERS
FABRICATION
FOCUSING
MIRRORS
OPTICS
PARTICLE ACCELERATORS
POLISHING
REFLECTION
SYNCHROTRONS
WAVELENGTHS
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Summary:We describe progress in the fabrication of short-focal-length total-external-reflection Kirkpatrick-Baez x-ray mirrors with ultralow figure errors. The short focal length optics produce nanoscale beams ( < 100 nm ) on conventional ( ∼ 64 m long) beamlines at third generation synchrotron sources. The total-external reflection optics are inherently achromatic and efficiently focus a white (polychromatic) or a tunable monochromatic spectrum of x rays. The ability to focus independent of wavelength allows novel new experimental capabilities. Mirrors have been fabricated both by computer assisted profiling (differential polishing) and by profile coating (coating through a mask onto ultra-smooth surfaces). A doubly focused 85 × 95 nm 2 hard x-ray nanobeam has been obtained on the UNICAT beamline 34-ID at the Advanced Photon Source. The performance of the mirrors, techniques for characterizing the spot size, and factors limiting focusing performance are discussed.
ISSN:0034-6748
1089-7623
DOI:10.1063/1.2125730