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Formation of hydroxyl and water layers on MgO films studied with ambient pressure XPS
To understand the interaction of water with MgO(100), a detailed quantitative assessment of the interfacial chemistry is necessary. We have used ambient pressure X-ray photoelectron spectroscopy (XPS) to measure molecular (H 2O) and dissociative (OH) water adsorption on a 4 monolayer (ML) thick MgO(...
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Published in: | Surface science 2011, Vol.605 (1), p.89-94 |
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Main Authors: | , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | To understand the interaction of water with MgO(100), a detailed quantitative assessment of the interfacial chemistry is necessary. We have used ambient pressure X-ray photoelectron spectroscopy (XPS) to measure molecular (H
2O) and dissociative (OH) water adsorption on a 4 monolayer (ML) thick MgO(100)/Ag(100) film under ambient conditions. Since the entire 4
ML metal oxide (Ox) film is probed by XPS, the reaction of the MgO film with water can be quantitatively studied. Using a multilayer model (Model 1) that measures changes in Ox thickness from O 1s (film) and Ag 3d (substrate) spectra, it is shown that the oxide portion of the MgO film becomes thinner upon hydroxylation. A reaction mechanism is postulated in which the top-most layer of MgO converts to Mg(OH)
2 upon dissociation of water. Based on this mechanism a second model (Model 2) is developed to calculate Ox and OH thickness changes based on OH/Ox intensity ratios from O 1s spectra measured
in situ, with the known initial Ox thickness prior to hydroxylation. Models 1 and 2 are applied to a 0.15
Torr isobar experiment, yielding similar results for H
2O, OH and Ox thickness changes as a function of relative humidity. |
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ISSN: | 0039-6028 1879-2758 |
DOI: | 10.1016/j.susc.2010.10.004 |