Structural Dependence of Grain Boundary Resistivity in Copper Nanowires

We report the direct measurement of individual grain boundary (GB) resistances and the critical role of GB structure in the increased resistivity in copper nanowires. By measuring both intra- and inter-grain resistance with a four-probe scanning tunneling microscope, large resistance jumps are revea...

Full description

Saved in:
Bibliographic Details
Published in:Japanese Journal of Applied Physics 2011-08, Vol.50 (8), p.08LB09-08LB09-4
Main Authors: Kim, Tae-Hwan, Nicholson, Don M, Zhang, X.-G, Evans, Boyd M, Kulkarni, Nagraj S, Kenik, Edward A, Meyer, Harry M, Radhakrishnan, Balasubramaniam, Li, An-Ping
Format: Article
Language:English
Subjects:
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
COPPER
SCATTERING
SYMMETRY
TUNNELING
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We report the direct measurement of individual grain boundary (GB) resistances and the critical role of GB structure in the increased resistivity in copper nanowires. By measuring both intra- and inter-grain resistance with a four-probe scanning tunneling microscope, large resistance jumps are revealed owing to successive scattering across high-angle random GBs, while the resistance changes at twin and other coincidence boundaries are negligibly small. The impurity distributions in the nanowires are characterized in correlating to the microstructures. The resistance of high symmetry coincidence GBs and the impurity contributions are then calculated using a first-principle method which confirms that the coincidence GBs have orders of magnitude smaller resistance than the high-angle random GBs.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.50.08LB09