Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks

We have realized the first demonstration of a table-top aerial imaging microscope capable of characterizing pattern and defect printability in extreme ultraviolet lithography masks. The microscope combines the output of a 13.2 nm wavelength, table-top, plasma-based, EUV laser with zone plate optics...

Full description

Saved in:
Bibliographic Details
Published in:Optics express 2010-07, Vol.18 (14), p.14467-14473
Main Authors: Brizuela, Fernando, Carbajo, Sergio, Sakdinawat, Anne, Alessi, David, Martz, Dale H, Wang, Yong, Luther, Bradley, Goldberg, Kenneth A, Mochi, Iacopo, Attwood, David T, La Fontaine, Bruno, Rocca, Jorge J, Menoni, Carmen S
Format: Article
Language:English
Subjects:
MATERIALS SCIENCE
OTHER INSTRUMENTATION
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We have realized the first demonstration of a table-top aerial imaging microscope capable of characterizing pattern and defect printability in extreme ultraviolet lithography masks. The microscope combines the output of a 13.2 nm wavelength, table-top, plasma-based, EUV laser with zone plate optics to mimic the imaging conditions of an EUV lithographic stepper. We have characterized the illumination of the system and performed line-edge roughness measurements on an EUVL mask. The results open a path for the development of a compact aerial imaging microscope for high-volume manufacturing.
ISSN:1094-4087
1094-4087
DOI:10.1364/OE.18.014467