Effect of domain structure on dielectric nonlinearity in epitaxial BiFeO3 films

Rayleigh analysis has been used to investigate dielectric nonlinearity in epitaxial (001)-oriented BiFeO3 films with engineered domain structures from single- to four-variant and stripe domain samples with 71° and 109° domain walls. Single-domain variant films display minimal irreversible contributi...

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Published in:Applied physics letters 2010-12, Vol.97 (26)
Main Authors: Ihlefeld, J. F., Folkman, C. M., Baek, S. H., Brennecka, G. L., George, M. C., Carroll, J. F., Eom, C. B.
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cited_by cdi_FETCH-LOGICAL-c322t-c99142d823cbdb94b2e51a4a9b421a29837ead2090dd15dd282f6ff71b2c3e313
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container_issue 26
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container_title Applied physics letters
container_volume 97
creator Ihlefeld, J. F.
Folkman, C. M.
Baek, S. H.
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description Rayleigh analysis has been used to investigate dielectric nonlinearity in epitaxial (001)-oriented BiFeO3 films with engineered domain structures from single- to four-variant and stripe domain samples with 71° and 109° domain walls. Single-domain variant films display minimal irreversible contributions, whereas the ratio of irreversible to reversible contributions increases by approximately one order of magnitude as the number of variants increases to two- and four-variants, respectively. These measurements indicate that the density of domain walls and degree of domain wall complexity influence the number and strength of domain wall pinning sites.
doi_str_mv 10.1063/1.3533017
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title Effect of domain structure on dielectric nonlinearity in epitaxial BiFeO3 films
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