Substrate-insensitive atomic layer deposition of plasmonic titanium nitride films

The plasmonic properties of titanium nitride (TiN) films depend on the type of substrate when using typical deposition methods such as sputtering. Here we show atomic layer deposition (ALD) of TiN films with very weak dependence of plasmonic properties on the substrate, which also suggests the predi...

Full description

Saved in:
Bibliographic Details
Published in:Optical materials express 2017-03, Vol.7 (3), p.777-784
Main Authors: Yu, Ing-Song, Cheng, Hsyi-En, Chang, Chun-Chieh, Lin, Yan-Wei, Chen, Hou-Tong, Wang, Yao-Chin, Yang, Zu-Po
Format: Article
Language:English
Subjects:
Annealing
Atomic layer deposition
Deposition
MATERIALS SCIENCE
Nanostructure
Performance evaluation
Plasmonics
Substrates
Titanium nitride
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The plasmonic properties of titanium nitride (TiN) films depend on the type of substrate when using typical deposition methods such as sputtering. Here we show atomic layer deposition (ALD) of TiN films with very weak dependence of plasmonic properties on the substrate, which also suggests the prediction and evaluation of plasmonic performance of TiN nanostructures on arbitrary substrates under a given deposition condition. Our results also observe that substrates with more nitrogen-terminated (N-terminated) surfaces will have significant impact on the deposition rate as well as the film plasmonic properties. We further illustrate that the plasmonic properties of ALD TiN films can be tailored by simply adjusting the deposition and/or post-deposition annealing temperatures. Such characteristics and the capability of conformal coating make ALD TiN films on templates ideal for applications that require the fabrication of complex 3D plasmonic nanostructures.
ISSN:2159-3930
2159-3930
DOI:10.1364/OME.7.000777