Metal–Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions To Enable Electrocatalytic Water Oxidation

Thin films of the metal–organic framework (MOF) NU-1000 were grown on conducting glass substrates. The films uniformly cover the conducting glass substrates and are composed of free-standing sub-micrometer rods. Subsequently, atomic layer deposition (ALD) was utilized to deposit Co2+ ions throughout...

Full description

Saved in:
Bibliographic Details
Published in:ACS applied materials & interfaces 2015-12, Vol.7 (51), p.28223-28230
Main Authors: Kung, Chung-Wei, Mondloch, Joseph E, Wang, Timothy C, Bury, Wojciech, Hoffeditz, William, Klahr, Benjamin M, Klet, Rachel C, Pellin, Michael J, Farha, Omar K, Hupp, Joseph T
Format: Article
Language:English
Subjects:
atomic layer deposition
cobalt oxide
electrocatalyst
metal−organic frameworks
pyrene
water oxidation
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Thin films of the metal–organic framework (MOF) NU-1000 were grown on conducting glass substrates. The films uniformly cover the conducting glass substrates and are composed of free-standing sub-micrometer rods. Subsequently, atomic layer deposition (ALD) was utilized to deposit Co2+ ions throughout the entire MOF film via self-limiting surface-mediated reaction chemistry. The Co ions bind at aqua and hydroxo sites lining the channels of NU-1000, resulting in three-dimensional arrays of separated Co ions in the MOF thin film. The Co-modified MOF thin films demonstrate promising electrocatalytic activity for water oxidation.
ISSN:1944-8244
1944-8252
DOI:10.1021/acsami.5b06901