Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)

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Bibliographic Details
Published in:ACS applied materials & interfaces 2015-08, Vol.7 (30)
Main Authors: Gharachorlou, Amir, Detwiler, Michael D., Gu, Xiang-Kui, Mayr, Lukas, Klötzer, Bernhard, Greeley, Jeffrey, Reifenberger, Ronald G., Delgass, W. Nicholas, Ribeiro, Fabio H., Zemlyanov, Dmitry Y.
Format: Article
Language:English
Online Access:Get full text
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ISSN:1944-8244
1944-8252
DOI:10.1021/acsami.5b03598