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Epitaxy of polar semiconductor Co3O4 (110): Growth, structure, and characterization

The (110) plane of Co3O4 spinel exhibits significantly higher rates of carbon monoxide conversion due to the presence of active Co3+ species at the surface. However, experimental studies of Co3O4 (110) surfaces and interfaces have been limited by the difficulties in growing high-quality films. We re...

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Bibliographic Details
Published in:Journal of applied physics 2014-06, Vol.115 (24)
Main Authors: Kormondy, Kristy J., Posadas, Agham B., Slepko, Alexander, Dhamdhere, Ajit, Smith, David J., Mitchell, Khadijih N., Willett-Gies, Travis I., Zollner, Stefan, Marshall, Luke G., Zhou, Jianshi, Demkov, Alexander A.
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Language:English
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Summary:The (110) plane of Co3O4 spinel exhibits significantly higher rates of carbon monoxide conversion due to the presence of active Co3+ species at the surface. However, experimental studies of Co3O4 (110) surfaces and interfaces have been limited by the difficulties in growing high-quality films. We report thin (10–250 Å) Co3O4 films grown by molecular beam epitaxy in the polar (110) direction on MgAl2O4 substrates. Reflection high-energy electron diffraction, atomic force microscopy, x-ray diffraction, and transmission electron microscopy measurements attest to the high quality of the as-grown films. Furthermore, we investigate the electronic structure of this material by core level and valence band x-ray photoelectron spectroscopy, and first-principles density functional theory calculations. Ellipsometry reveals a direct band gap of 0.75 eV and other interband transitions at higher energies. A valence band offset of 3.2 eV is measured for the Co3O4/MgAl2O4 heterostructure. Magnetic measurements show the signature of antiferromagnetic ordering at 49 K. FTIR ellipsometry finds three infrared-active phonons between 300 and 700 cm−1.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.4885048