Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens

We report the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using sputtering deposition technique, and a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray ch...

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Bibliographic Details
Published in:Optics express 2015-01, Vol.23 (10)
Main Authors: Huang, Xiaojing, Conley, Raymond, Bouet, Nathalie, Zhou, Juan, Macrander, Albert, Maser, Jorg, Yan, Hanfei, Nazaretski, Evgeny, Lauer, Kenneth, Harder, Ross, Robinson, Ian K., Kalbfleisch, Sebastian, Chu, Yong S.
Format: Article
Language:English
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Summary:We report the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using sputtering deposition technique, and a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization showed an efficiency of 27% and a focus size of 24 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging was achieved in the fabricated wedged MLL. We anticipate that continuous development on wedged MLL will advance x-ray nanofocusing optics to new frontiers, and enriches capabilities and opportunities for hard X-ray microscopy.
ISSN:1094-4087
1094-4087