Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens

We report the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using sputtering deposition technique, and a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray ch...

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Published in:Optics express 2015-01, Vol.23 (10)
Main Authors: Huang, Xiaojing, Conley, Raymond, Bouet, Nathalie, Zhou, Juan, Macrander, Albert, Maser, Jorg, Yan, Hanfei, Nazaretski, Evgeny, Lauer, Kenneth, Harder, Ross, Robinson, Ian K., Kalbfleisch, Sebastian, Chu, Yong S.
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container_issue 10
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container_title Optics express
container_volume 23
creator Huang, Xiaojing
Conley, Raymond
Bouet, Nathalie
Zhou, Juan
Macrander, Albert
Maser, Jorg
Yan, Hanfei
Nazaretski, Evgeny
Lauer, Kenneth
Harder, Ross
Robinson, Ian K.
Kalbfleisch, Sebastian
Chu, Yong S.
description We report the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using sputtering deposition technique, and a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization showed an efficiency of 27% and a focus size of 24 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging was achieved in the fabricated wedged MLL. We anticipate that continuous development on wedged MLL will advance x-ray nanofocusing optics to new frontiers, and enriches capabilities and opportunities for hard X-ray microscopy.
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title Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens
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