Effects of temperature and surface contamination on D retention in ultrathin Li films on TZM

In this work, we investigate deuterium retention at the Mo–Li interface by studying thin Li films three monolayers thick on a TZM Mo alloy. Li films at temperatures between 315 and 460K were exposed to a deuterium ion beam and D retention was measured using temperature programmed desorption. In the...

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Bibliographic Details
Published in:Journal of nuclear materials 2015-08, Vol.463 (C), p.1177-1180
Main Authors: Capece, A.M., Roszell, J.P., Skinner, C.H., Koel, B.E.
Format: Article
Language:English
Subjects:
Deuterium
deuterium retention
Ion beams
Li thin films
Lithium
MATERIALS SCIENCE
Molybdenum
Molybdenum base alloys
Nuclear engineering
oxidation
Thick films
Thin films
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Summary:In this work, we investigate deuterium retention at the Mo–Li interface by studying thin Li films three monolayers thick on a TZM Mo alloy. Li films at temperatures between 315 and 460K were exposed to a deuterium ion beam and D retention was measured using temperature programmed desorption. In the absence of oxygen, D is retained as LiD, and the relative amount of retained D decreases with increasing substrate temperature. In three-monolayer thick lithium oxide films, the amount of D retained was 2.5 times higher than the amount retained as LiD in the metallic Li film. However, oxygen reduces the thermal stability of D in the film, causing D2O and D2 to be released from the surface at temperatures 150–200K below the LiD decomposition temperature. These results highlight the importance of maintaining a metallic Li layer for high D retention in Li films on TZM at elevated temperatures.
ISSN:0022-3115
1873-4820
DOI:10.1016/j.jnucmat.2014.10.048