Defect structures created during abnormal grain growth in pulsed-laser deposited nickel

The thermal stability of nanograined pulsed-laser deposited nickel was studied by annealing free-standing thin films in situ in a transmission electron microscope. The observed grain growth was sporadic and catastrophic, as expected for abnormal grain growth. The large grains contained a variety of...

Full description

Saved in:
Bibliographic Details
Published in:Acta materialia 2008-02, Vol.56 (4), p.794-801
Main Authors: Hattar, K., Follstaedt, D.M., Knapp, J.A., Robertson, I.M.
Format: Article
Language:English
Subjects:
Abnormal grain growth
Annealing
Applied sciences
Crystal defects
Deposition
Dislocation loops
Electron microscopy
Exact sciences and technology
Grain growth
Metals. Metallurgy
Nanocomposites
Nanostructure
Nickel
Nickel, laser deposited
Production techniques
Surface treatment
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The thermal stability of nanograined pulsed-laser deposited nickel was studied by annealing free-standing thin films in situ in a transmission electron microscope. The observed grain growth was sporadic and catastrophic, as expected for abnormal grain growth. The large grains contained a variety of defects that included twins, dislocation lines, small dislocation loops and stacking-fault tetrahedra. This microstructure was developed at annealing temperatures as low as 498 K and was stable at the annealing temperature. The proposed source of the defects and especially the stacking-fault tetrahedra is the grain boundaries, which have excess free volume. This defect source provides insight to the structure of the deposited grain boundaries, which has important consequences for the macroscopic mechanical properties of nanograined pulsed-laser deposited nickel.
ISSN:1359-6454
1873-2453
DOI:10.1016/j.actamat.2007.10.027