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Growth of Cr-doped TiO2 films in the rutile and anatase structures by oxygen plasma assisted molecular beam epitaxy
As part of a search for new spintronic materials, highly ordered films of CrxTi1--xO2 in both the rutile and anatase structures and for several Cr concentrations ranging from x=0*02 to 0*16 were grown by oxygen plasma assisted molecular beam epitaxy. X--ray photoelectron diffraction data of the Cr 2...
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Published in: | Thin solid films 2005-07, Vol.484 (1-2), p.289-298 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | As part of a search for new spintronic materials, highly ordered films of CrxTi1--xO2 in both the rutile and anatase structures and for several Cr concentrations ranging from x=0*02 to 0*16 were grown by oxygen plasma assisted molecular beam epitaxy. X--ray photoelectron diffraction data of the Cr 2p level exhibit the same patterns and the same modulation amplitudes as those observed for Ti 2p, providing a strong indication that a large fraction of the Cr atoms occupy substitutional lattice sites in both structures. The Cr 2p core--level spectra as well as a Cr 3d related dopant signal above the valence band of TiO2 are characteristic of Cr(3)(+)ions. At room temperature, Cr--doped anatase films exhibit ferromagnetic order with a saturation magnetization of ~0*6 muB per Cr atom and strong in--plane anisotropy. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2005.02.028 |