Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF 3 /O 2 mixtures

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Bibliographic Details
Published in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2018-03, Vol.36 (2)
Main Authors: Huang, Shuo, Volynets, Vladimir, Hamilton, James R., Nam, Sang Ki, Song, In-Cheol, Lu, Siqing, Tennyson, Jonathan, Kushner, Mark J.
Format: Article
Language:English
Subjects:
Materials Science
Physics
Online Access:Get full text
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Summary:Not provided.
ISSN:0734-2101
1520-8559
DOI:10.1116/1.5019673