Crossover between Electron-Phonon and Boundary-Resistance Limits to Thermal Relaxation in Copper Films

We observe a crossover from electron-phonon (e-ph) coupling limited energy relaxation to that governed by thermal boundary resistance (phonon-phonon coupling, ph-ph) in copper films at subkelvin temperatures. Our measurement yields a quantitative picture of heat currents, in terms of temperature dep...

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Bibliographic Details
Published in:Physical review applied 2019-08, Vol.12 (2), Article 024051
Main Authors: Wang, L. B., Saira, O.-P., Golubev, D. S., Pekola, J. P.
Format: Article
Language:English
Subjects:
NANOSCIENCE AND NANOTECHNOLOGY
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Summary:We observe a crossover from electron-phonon (e-ph) coupling limited energy relaxation to that governed by thermal boundary resistance (phonon-phonon coupling, ph-ph) in copper films at subkelvin temperatures. Our measurement yields a quantitative picture of heat currents, in terms of temperature dependences and magnitudes, in both e-ph and pp limited regimes, respectively. We show that by adding a third layer in between the copper film and the substrate, the thermal boundary resistance is increased fourfold, consistent with an assumed series connection of thermal resistances.
ISSN:2331-7019
2331-7019
DOI:10.1103/PhysRevApplied.12.024051