Dynamics of electronic excitations involved in laser-induced damage in HfO2 and SiO2 films

The dynamics of electron excitations associated with the initiation of laser-induced damage in hafnia and silica monolayer films are investigated using time-resolved damage testing involving a pair of 0.7 ps pulses with adjustable delay and laser pulse fluences. Results in hafnia indicate that the r...

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Bibliographic Details
Published in:Optics letters 2021-04, Vol.46 (7), p.1684-1687
Main Authors: Kafka, K R P, Hoffman, B N, Kozlov, A Kozlov, Demos, S G
Format: Article
Language:English
Subjects:
Delay time
Excitation
Fluence
Hafnium oxide
Laser damage
Lasers
MATERIALS SCIENCE
Morphology
Silicon dioxide
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Summary:The dynamics of electron excitations associated with the initiation of laser-induced damage in hafnia and silica monolayer films are investigated using time-resolved damage testing involving a pair of 0.7 ps pulses with adjustable delay and laser pulse fluences. Results in hafnia indicate that the relaxation profile depends on the pump-pulse fluence (initial excitation), and as a result, it exhibits an effective lifetime that is variable. Analogous experiments in silica form two different types of damage morphologies that are observed on different ranges of delay times.
ISSN:0146-9592
1539-4794
DOI:10.1364/OL.421962