The nature of the DX state in Ge-doped AlGaN

Electrical conductivity in high Al-content AlGaN has been severely limited, presumably due to a DX transition forming an acceptor state and subsequent self-compensation, which imposed an upper limit on the achievable free carrier concentration. To elucidate this idea, this paper examines Ge doping a...

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Bibliographic Details
Published in:Applied physics letters 2020-06, Vol.116 (22)
Main Authors: Bagheri, Pegah, Kirste, Ronny, Reddy, Pramod, Washiyama, Shun, Mita, Seiji, Sarkar, Biplab, Collazo, Ramón, Sitar, Zlatko
Format: Article
Language:English
Subjects:
Physics
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Summary:Electrical conductivity in high Al-content AlGaN has been severely limited, presumably due to a DX transition forming an acceptor state and subsequent self-compensation, which imposed an upper limit on the achievable free carrier concentration. To elucidate this idea, this paper examines Ge doping as a function of Al-content in AlGaN and finds a different behavior: for Al compositions below 40%, Ge behaved as a shallow donor with an ionization energy below 20 meV, while for Al compositions above 40%, above DX transition, it emerged as a deep donor. The ionization energy of this deep state increased with increasing Al content and reached 150 meV for 60% AlGaN. Around the DX transition, a continuous change from the shallow to deep donor was observed. In contrast to the density functional theory predictions, acceptor-type states corresponding to a DX-type transition were not observed. This finding may have profound technological consequences for the development of AlGaN- and AlN-based devices as it offers a feasible pathway to high n-conductivity in these compounds.
ISSN:0003-6951
1077-3118