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Additive engineering for robust interphases to stabilize high-Ni layered structures at ultra-high voltage of 4.8 V
Nickel-rich layered cathode materials promise high energy density for next-generation batteries when coupled with lithium metal anodes. However, the practical capacities accessible are far less than the theoretical values due to their structural instability during cycling, especially when charged at...
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Published in: | Nature energy 2022-06, Vol.7 (6), p.484-494 |
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Main Authors: | , , , , , , , , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Nickel-rich layered cathode materials promise high energy density for next-generation batteries when coupled with lithium metal anodes. However, the practical capacities accessible are far less than the theoretical values due to their structural instability during cycling, especially when charged at high voltages. Here we demonstrate that stable cycling with an ultra-high cut-off voltage of 4.8 V can be realized by using an appropriate amount of lithium difluorophosphate in a common commercial electrolyte. The Li||LiNi
0.76
Mn
0.14
Co
0.10
O
2
cell retains 97% of the initial capacity (235 mAh g
–1
) after 200 cycles. The cycling stability is ascribed to the robust interphase on the cathode. It is formed by lithium difluorophosphate decomposition, which is facilitated by the catalytic effect of transition metals. The decomposition products (Li
3
PO
4
and LiF) form a protective interphase. This suppresses transition metal dissolution and cathode surface reconstruction. It also facilitates uniform Li distribution within the cathode, effectively mitigating the strain and crack formation.
Severe capacity decay at high voltages prevents the application of Ni-rich layered oxide cathodes. Here the authors report an electrolyte additive in a common commercial electrolyte that enables stable cycling at an ultra-high voltage of 4.8 V. |
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ISSN: | 2058-7546 2058-7546 |
DOI: | 10.1038/s41560-022-01020-x |