Ion Beam Deposition of Thin Films: Growth Processes and Nanostructure Formation

Ion beam deposition is a process far from thermodynamic equilibrium and is in particular suited to grow metastable thin films with diamond-like properties, such as tetrahedral amorphous carbon (ta-C) and cubic boron nitride (c-BN). In this contribution the atomistic description of the deposition and...

Full description

Saved in:
Bibliographic Details
Published in:AIP conference proceedings 2004-01, Vol.740 (1), p.101-116
Main Author: Hofsass, Hans C
Format: Article
Language:English
Subjects:
BORON NITRIDES
COMPOSITE MATERIALS
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
DEPOSITION
DIAMONDS
DISTRIBUTION
EQUILIBRIUM
ION BEAMS
MASS
METALS
MORPHOLOGY
NANOSTRUCTURES
THIN FILMS
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Ion beam deposition is a process far from thermodynamic equilibrium and is in particular suited to grow metastable thin films with diamond-like properties, such as tetrahedral amorphous carbon (ta-C) and cubic boron nitride (c-BN). In this contribution the atomistic description of the deposition and growth processes are reviewed and compared to experimental results, obtained from mass selected ion beam deposition. The focus will be set to the nucleation and growth processes of boron nitride as a model system for ion based thin film formation. Furthermore, recent examples for nanostructure formation in ion deposited compound thin films will be presented. Ion beam deposited metal-carbon nano-composite thin films exhibit a variety of different morphologies such as rather homogeneous nanocluster distributions embedded in an a-C matrix, but also the self-organized formation of nanoscale multilayer structures.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.1843499