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Laser writing of semiconductor nanoparticles and quantum dots

Silica aerogels were patterned with CdS using a photolithographic technique based on local heating with infrared (IR) light. The solvent of silica hydrogels was exchanged with an aqueous solution of the precursors CdNO 3 and NH 4 OH , all precooled to a temperature of 5 ° C . Half of the bathing sol...

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Bibliographic Details
Published in:Applied physics letters 2004-12, Vol.85 (24), p.6007-6009
Main Authors: Bertino, M. F., Gadipalli, R. R., Story, J. G., Williams, C. G., Zhang, G., Sotiriou-Leventis, C., Tokuhiro, A. T., Guha, S., Leventis, N.
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Language:English
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Summary:Silica aerogels were patterned with CdS using a photolithographic technique based on local heating with infrared (IR) light. The solvent of silica hydrogels was exchanged with an aqueous solution of the precursors CdNO 3 and NH 4 OH , all precooled to a temperature of 5 ° C . Half of the bathing solution was then replaced by a thiourea solution. After thiourea diffused into the hydrogels, the samples were exposed to a focused IR beam from a continuous wave, Nd - YAG laser. The precursors reacted in the spots heated by the IR beam to form CdS nanoparticles. We lithographed features with a diameter of about 40 μ m , which extended inside the monoliths for up to 4 mm . Samples were characterized with transmission electron microscopy and optical absorption, photoluminescence, and Raman spectroscopies. Spots illuminated by the IR beam were made up by CdS nanoparticles dispersed in a silica matrix. The CdS nanoparticles had a diameter in the 4 - 6 nm range in samples exposed for 4 min to the IR beam, and of up to 100 nm in samples exposed for 10 min .
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1836000