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Smoothing of (111) oriented Cu films by post-deposition in situ 20 – 100 eV Ar ion bombardment
We have studied the effect of low energy ( 20 – 100 eV ) Ar bombardment on the surface roughness of (111) oriented Cu films both experimentally and by molecular-dynamics simulations. We found, in good agreement between the experiments and the simulations, that a significant reduction of the surface...
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Published in: | Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2004-11, Vol.22 (6), p.2273-2275 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Online Access: | Get full text |
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Summary: | We have studied the effect of low energy
(
20
–
100
eV
)
Ar bombardment on the surface roughness of (111) oriented Cu films both experimentally and by molecular-dynamics simulations. We found, in good agreement between the experiments and the simulations, that a significant reduction of the surface roughness can be induced at all energies in this range. However, the angle of incidence for optimal smoothing depends strongly on the ion energy, whereby the lower energies used are more efficient at near normal incidence, and the higher energies are more efficient for off-normal angles (e.g.,
>
45
degrees
). |
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ISSN: | 0734-2101 1520-8559 |
DOI: | 10.1116/1.1795825 |