Loading…

At-Wavelength Interferometry of High-NA Diffraction-Limited EUV Optics

Recent advances in all-reflective diffraction-limited optical systems designed for extreme ultraviolet (EUV) lithography have pushed numerical aperture (NA) values from 0.1 to 0.3, providing Rayleigh resolutions of 27-nm. Worldwide, several high-NA EUV optics are being deployed to serve in the devel...

Full description

Saved in:

Bibliographic Details
Main Authors:	Goldberg, Kenneth A, Naulleau, Patrick, Rekawa, Senajith, Denham, Paul, Liddle, J Alexander, Anderson, Erik, Jackson, Keith, Bokor, Jeffrey, Attwood, David
Format:	Conference Proceeding
Language:	English
Subjects:	ACCURACY ADVANCED LIGHT SOURCE ALIGNMENT APERTURES BEAM OPTICS DESIGN DIFFRACTION EXTREME ULTRAVIOLET RADIATION INTERFEROMETERS INTERFEROMETRY MIRRORS OPTICAL SYSTEMS PARTICLE ACCELERATORS RESOLUTION SYNCHROTRON RADIATION TESTING WAVELENGTHS
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!

cited_by
cites
container_end_page	860
container_issue	1
container_start_page	855
container_title
container_volume	705
creator	Goldberg, Kenneth A Naulleau, Patrick Rekawa, Senajith Denham, Paul Liddle, J Alexander Anderson, Erik Jackson, Keith Bokor, Jeffrey Attwood, David
description	Recent advances in all-reflective diffraction-limited optical systems designed for extreme ultraviolet (EUV) lithography have pushed numerical aperture (NA) values from 0.1 to 0.3, providing Rayleigh resolutions of 27-nm. Worldwide, several high-NA EUV optics are being deployed to serve in the development of advanced lithographic techniques required for EUV lithography, including the creation and testing of new, high-resolution photoresists. One such system is installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. Sub-A-accuracy optical testing and alignment techniques, developed for use with the previous generations of EUV lithographic optical systems, are being extended for use at high NA. Considerations for interferometer design and use are discussed.
doi_str_mv	10.1063/1.1757930
format	conference_proceeding
fullrecord	<record><control><sourceid>proquest_osti_</sourceid><recordid>TN_cdi_osti_scitechconnect_20653087</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>29722340</sourcerecordid><originalsourceid>FETCH-LOGICAL-o249t-64eb27f8c98d813f55ce4970415119c8d39bf2ae21af42a9a55708cbf73149873</originalsourceid><addsrcrecordid>eNotj8tOAjEYRhsviYAufINJTNwV_96m7ZIgCMlENqLuJqW0UDNMcVpIfHuJuDqbk5PvQ-iewJBAyZ7IkEghNYML1CNCECxLUl6iPkgmOBAF9Ar1ADTHlLPPG9RP6QuAailVD01HGX-Yo2tcu8nbYt5m13nXxZ3L3U8RfTELmy1-HRXPwfvO2Bxii6uwC9mti8nyvVjsc7DpFl170yR3988BWk4nb-MZrhYv8_GowpFynXHJ3YpKr6xWa0WYF8I6riVwIgjRVq2ZXnlqHCXGc2q0EUKCsisvGeFaSTZAD-duTDnUyZ5m2K2NbetsrimUgsGf9Xi29l38PriU611I1jWNaV08pPr0nVLGgf0CiXRaQw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype><pqid>29722340</pqid></control><display><type>conference_proceeding</type><title>At-Wavelength Interferometry of High-NA Diffraction-Limited EUV Optics</title><source>American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list)</source><creator>Goldberg, Kenneth A ; Naulleau, Patrick ; Rekawa, Senajith ; Denham, Paul ; Liddle, J Alexander ; Anderson, Erik ; Jackson, Keith ; Bokor, Jeffrey ; Attwood, David</creator><creatorcontrib>Goldberg, Kenneth A ; Naulleau, Patrick ; Rekawa, Senajith ; Denham, Paul ; Liddle, J Alexander ; Anderson, Erik ; Jackson, Keith ; Bokor, Jeffrey ; Attwood, David</creatorcontrib><description>Recent advances in all-reflective diffraction-limited optical systems designed for extreme ultraviolet (EUV) lithography have pushed numerical aperture (NA) values from 0.1 to 0.3, providing Rayleigh resolutions of 27-nm. Worldwide, several high-NA EUV optics are being deployed to serve in the development of advanced lithographic techniques required for EUV lithography, including the creation and testing of new, high-resolution photoresists. One such system is installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. Sub-A-accuracy optical testing and alignment techniques, developed for use with the previous generations of EUV lithographic optical systems, are being extended for use at high NA. Considerations for interferometer design and use are discussed.</description><identifier>ISSN: 0094-243X</identifier><identifier>ISBN: 0735401802</identifier><identifier>ISBN: 9780735401808</identifier><identifier>EISSN: 1551-7616</identifier><identifier>DOI: 10.1063/1.1757930</identifier><language>eng</language><publisher>United States</publisher><subject>ACCURACY ; ADVANCED LIGHT SOURCE ; ALIGNMENT ; APERTURES ; BEAM OPTICS ; DESIGN ; DIFFRACTION ; EXTREME ULTRAVIOLET RADIATION ; INTERFEROMETERS ; INTERFEROMETRY ; MIRRORS ; OPTICAL SYSTEMS ; PARTICLE ACCELERATORS ; RESOLUTION ; SYNCHROTRON RADIATION ; TESTING ; WAVELENGTHS</subject><ispartof>AIP conference proceedings, 2004, Vol.705 (1), p.855-860</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,780,784,885,27924,27925</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/20653087$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Goldberg, Kenneth A</creatorcontrib><creatorcontrib>Naulleau, Patrick</creatorcontrib><creatorcontrib>Rekawa, Senajith</creatorcontrib><creatorcontrib>Denham, Paul</creatorcontrib><creatorcontrib>Liddle, J Alexander</creatorcontrib><creatorcontrib>Anderson, Erik</creatorcontrib><creatorcontrib>Jackson, Keith</creatorcontrib><creatorcontrib>Bokor, Jeffrey</creatorcontrib><creatorcontrib>Attwood, David</creatorcontrib><title>At-Wavelength Interferometry of High-NA Diffraction-Limited EUV Optics</title><title>AIP conference proceedings</title><description>Recent advances in all-reflective diffraction-limited optical systems designed for extreme ultraviolet (EUV) lithography have pushed numerical aperture (NA) values from 0.1 to 0.3, providing Rayleigh resolutions of 27-nm. Worldwide, several high-NA EUV optics are being deployed to serve in the development of advanced lithographic techniques required for EUV lithography, including the creation and testing of new, high-resolution photoresists. One such system is installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. Sub-A-accuracy optical testing and alignment techniques, developed for use with the previous generations of EUV lithographic optical systems, are being extended for use at high NA. Considerations for interferometer design and use are discussed.</description><subject>ACCURACY</subject><subject>ADVANCED LIGHT SOURCE</subject><subject>ALIGNMENT</subject><subject>APERTURES</subject><subject>BEAM OPTICS</subject><subject>DESIGN</subject><subject>DIFFRACTION</subject><subject>EXTREME ULTRAVIOLET RADIATION</subject><subject>INTERFEROMETERS</subject><subject>INTERFEROMETRY</subject><subject>MIRRORS</subject><subject>OPTICAL SYSTEMS</subject><subject>PARTICLE ACCELERATORS</subject><subject>RESOLUTION</subject><subject>SYNCHROTRON RADIATION</subject><subject>TESTING</subject><subject>WAVELENGTHS</subject><issn>0094-243X</issn><issn>1551-7616</issn><isbn>0735401802</isbn><isbn>9780735401808</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2004</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNotj8tOAjEYRhsviYAufINJTNwV_96m7ZIgCMlENqLuJqW0UDNMcVpIfHuJuDqbk5PvQ-iewJBAyZ7IkEghNYML1CNCECxLUl6iPkgmOBAF9Ar1ADTHlLPPG9RP6QuAailVD01HGX-Yo2tcu8nbYt5m13nXxZ3L3U8RfTELmy1-HRXPwfvO2Bxii6uwC9mti8nyvVjsc7DpFl170yR3988BWk4nb-MZrhYv8_GowpFynXHJ3YpKr6xWa0WYF8I6riVwIgjRVq2ZXnlqHCXGc2q0EUKCsisvGeFaSTZAD-duTDnUyZ5m2K2NbetsrimUgsGf9Xi29l38PriU611I1jWNaV08pPr0nVLGgf0CiXRaQw</recordid><startdate>20040512</startdate><enddate>20040512</enddate><creator>Goldberg, Kenneth A</creator><creator>Naulleau, Patrick</creator><creator>Rekawa, Senajith</creator><creator>Denham, Paul</creator><creator>Liddle, J Alexander</creator><creator>Anderson, Erik</creator><creator>Jackson, Keith</creator><creator>Bokor, Jeffrey</creator><creator>Attwood, David</creator><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>OTOTI</scope></search><sort><creationdate>20040512</creationdate><title>At-Wavelength Interferometry of High-NA Diffraction-Limited EUV Optics</title><author>Goldberg, Kenneth A ; Naulleau, Patrick ; Rekawa, Senajith ; Denham, Paul ; Liddle, J Alexander ; Anderson, Erik ; Jackson, Keith ; Bokor, Jeffrey ; Attwood, David</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-o249t-64eb27f8c98d813f55ce4970415119c8d39bf2ae21af42a9a55708cbf73149873</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2004</creationdate><topic>ACCURACY</topic><topic>ADVANCED LIGHT SOURCE</topic><topic>ALIGNMENT</topic><topic>APERTURES</topic><topic>BEAM OPTICS</topic><topic>DESIGN</topic><topic>DIFFRACTION</topic><topic>EXTREME ULTRAVIOLET RADIATION</topic><topic>INTERFEROMETERS</topic><topic>INTERFEROMETRY</topic><topic>MIRRORS</topic><topic>OPTICAL SYSTEMS</topic><topic>PARTICLE ACCELERATORS</topic><topic>RESOLUTION</topic><topic>SYNCHROTRON RADIATION</topic><topic>TESTING</topic><topic>WAVELENGTHS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Goldberg, Kenneth A</creatorcontrib><creatorcontrib>Naulleau, Patrick</creatorcontrib><creatorcontrib>Rekawa, Senajith</creatorcontrib><creatorcontrib>Denham, Paul</creatorcontrib><creatorcontrib>Liddle, J Alexander</creatorcontrib><creatorcontrib>Anderson, Erik</creatorcontrib><creatorcontrib>Jackson, Keith</creatorcontrib><creatorcontrib>Bokor, Jeffrey</creatorcontrib><creatorcontrib>Attwood, David</creatorcontrib><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>OSTI.GOV</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Goldberg, Kenneth A</au><au>Naulleau, Patrick</au><au>Rekawa, Senajith</au><au>Denham, Paul</au><au>Liddle, J Alexander</au><au>Anderson, Erik</au><au>Jackson, Keith</au><au>Bokor, Jeffrey</au><au>Attwood, David</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>At-Wavelength Interferometry of High-NA Diffraction-Limited EUV Optics</atitle><btitle>AIP conference proceedings</btitle><date>2004-05-12</date><risdate>2004</risdate><volume>705</volume><issue>1</issue><spage>855</spage><epage>860</epage><pages>855-860</pages><issn>0094-243X</issn><eissn>1551-7616</eissn><isbn>0735401802</isbn><isbn>9780735401808</isbn><abstract>Recent advances in all-reflective diffraction-limited optical systems designed for extreme ultraviolet (EUV) lithography have pushed numerical aperture (NA) values from 0.1 to 0.3, providing Rayleigh resolutions of 27-nm. Worldwide, several high-NA EUV optics are being deployed to serve in the development of advanced lithographic techniques required for EUV lithography, including the creation and testing of new, high-resolution photoresists. One such system is installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. Sub-A-accuracy optical testing and alignment techniques, developed for use with the previous generations of EUV lithographic optical systems, are being extended for use at high NA. Considerations for interferometer design and use are discussed.</abstract><cop>United States</cop><doi>10.1063/1.1757930</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record>
fulltext	fulltext
identifier	ISSN: 0094-243X
ispartof	AIP conference proceedings, 2004, Vol.705 (1), p.855-860
issn	0094-243X 1551-7616
language	eng
recordid	cdi_osti_scitechconnect_20653087
source	American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list)
subjects	ACCURACY ADVANCED LIGHT SOURCE ALIGNMENT APERTURES BEAM OPTICS DESIGN DIFFRACTION EXTREME ULTRAVIOLET RADIATION INTERFEROMETERS INTERFEROMETRY MIRRORS OPTICAL SYSTEMS PARTICLE ACCELERATORS RESOLUTION SYNCHROTRON RADIATION TESTING WAVELENGTHS
title	At-Wavelength Interferometry of High-NA Diffraction-Limited EUV Optics
url	http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-24T13%3A14%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=At-Wavelength%20Interferometry%20of%20High-NA%20Diffraction-Limited%20EUV%20Optics&rft.btitle=AIP%20conference%20proceedings&rft.au=Goldberg,%20Kenneth%20A&rft.date=2004-05-12&rft.volume=705&rft.issue=1&rft.spage=855&rft.epage=860&rft.pages=855-860&rft.issn=0094-243X&rft.eissn=1551-7616&rft.isbn=0735401802&rft.isbn_list=9780735401808&rft_id=info:doi/10.1063/1.1757930&rft_dat=%3Cproquest_osti_%3E29722340%3C/proquest_osti_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-o249t-64eb27f8c98d813f55ce4970415119c8d39bf2ae21af42a9a55708cbf73149873%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=29722340&rft_id=info:pmid/&rfr_iscdi=true