Effect of low numerical-aperture femtosecond two-photon absorption on (SU-8) resist for ultrahigh-aspect-ratio microstereolithography

We report the quantitative characterization and analysis on the solidification of SU-8, a chemically amplified near-ultraviolet ultrathick resist, based on two-photon-absorbed (TPA) near-infrared photopolymerization. The resolution of TPA photopolymerized SU-8 voxels and lines is studied as a functi...

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Bibliographic Details
Published in:Journal of applied physics 2005-03, Vol.97 (5)
Main Authors: Teh, W. H., Dürig, U., Drechsler, U., Smith, C. G., Güntherodt, H.-J.
Format: Article
Language:English
Subjects:
ABSORPTION
APERTURES
ASPECT RATIO
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
FABRICATION
LASERS
MATRIX MATERIALS
NONLINEAR OPTICS
PHOTONS
POLYMERIZATION
POLYMERS
PULSES
RESOLUTION
SHUTTERS
SOLIDIFICATION
THREE-DIMENSIONAL CALCULATIONS
ULTRAVIOLET RADIATION
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Summary:We report the quantitative characterization and analysis on the solidification of SU-8, a chemically amplified near-ultraviolet ultrathick resist, based on two-photon-absorbed (TPA) near-infrared photopolymerization. The resolution of TPA photopolymerized SU-8 voxels and lines is studied as a function of laser-pulse energy, single-shot exposure time, and scanning speed. Two-photon microstereolithography using SU-8 as the matrix material was verified by the fabrication of SU-8 photoplastic structures with subdiffraction-limit resolution. We show that the nonlinear velocity dependence of TPA photopolymerization can be used as the shutter mechanism for disruptive three-dimensional (3D) lithography. This mechanism, when combined with low numerical-aperture optics is exploited for the rapid 3D microfabrication of ultrahigh-aspect-ratio (up to 50:1) photoplastic pillars, planes, and cage structures.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.1856214