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Morphological instability in InAs/GaSb superlattices due to interfacial bonds

Synchrotron x-ray diffraction is used to compare the misfit strain and composition in a self-organized nanowire array in an InAs/GaSb superlattice with InSb interfacial bonds to a planar InAs/GaSb superlattice with GaAs interfacial bonds. It is found that the morphological instability that occurs in...

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Bibliographic Details
Published in:Physical review letters 2005-08, Vol.95 (9), p.096104.1-096104.4, Article 096104
Main Authors: LI, J. H, STOKES, D. W, CAHA, O, AMMU, S. L, BAI, J, BASSLER, K. E, MOSS, S. C
Format: Article
Language:English
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Summary:Synchrotron x-ray diffraction is used to compare the misfit strain and composition in a self-organized nanowire array in an InAs/GaSb superlattice with InSb interfacial bonds to a planar InAs/GaSb superlattice with GaAs interfacial bonds. It is found that the morphological instability that occurs in the nanowire array results from the large misfit strain that the InSb interfacial bonds have in the nanowire array. Based on this result, we propose that tailoring the type of interfacial bonds during the epitaxial growth of III-V semiconductor films provides a novel approach for producing the technologically important morphological instability in anomalously thin layers.
ISSN:0031-9007
1079-7114
DOI:10.1103/PhysRevLett.95.096104