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Soft magnetic granular material Co–Fe–Hf–O for micromagnetic device applications
A granular magnetic material, Co–Fe–Hf–O, has been developed-using dc pulsed magnetron reactive sputtering. The deposition rate is as high as 1.3nm∕s. The electrical and magnetic properties of Co–Fe–Hf–O film can be tuned by changing O2 during deposition. A highly resistive, magnetically soft film h...
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Published in: | Journal of applied physics 2005-05, Vol.97 (10) |
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container_issue | 10 |
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container_title | Journal of applied physics |
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creator | Li, Liangliang Crawford, Ankur M. Wang, Shan X. Marshall, Ann F. Mao, Ming Schneider, Thomas Bubber, Randhir |
description | A granular magnetic material, Co–Fe–Hf–O, has been developed-using dc pulsed magnetron reactive sputtering. The deposition rate is as high as 1.3nm∕s. The electrical and magnetic properties of Co–Fe–Hf–O film can be tuned by changing O2 during deposition. A highly resistive, magnetically soft film has been achieved in a small range of the O2∕(Ar+O2) gas flow ratio. The origin of the dependence of magnetic and electrical properties of this material is studied and explained by monitoring the evolution of the film microstructure, using x-ray diffraction and transmission electron microscopy. |
doi_str_mv | 10.1063/1.1853238 |
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fullrecord | <record><control><sourceid>crossref_osti_</sourceid><recordid>TN_cdi_osti_scitechconnect_20711622</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1063_1_1853238</sourcerecordid><originalsourceid>FETCH-LOGICAL-c257t-58ccfdd12b29666360efed1b6d0b5bc7e547fdc7376faa6e39c9e0c109fa149e3</originalsourceid><addsrcrecordid>eNo9kM9KAzEQxoMouFYPvsGCJw9bM0k32RylWCsUevDPdcnOTmpku1uSKHjzHXxDn8SVFi_fB_P9Zhg-xi6BT4EreQNTqEopZHXEMuCVKXRZ8mOWcS6gqIw2p-wsxjfOASppMvbyOLiUb-2mp-Qx3wTbv3c2jJNEwdsunw8_X98LGmXpRlnnbhhTj2H4X2rpwyPldrfrPNrkhz6esxNnu0gXB5-w58Xd03xZrNb3D_PbVYGi1KkoK0TXtiAaYZRSUnFy1EKjWt6UDWoqZ9q1qKVWzlpF0qAhjsCNszAzJCfsan93iMnXEX0ifMWh7wlTLbgGUEKM1PWeGr-OMZCrd8Fvbfisgdd_tdVQH2qTv11YYsE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Soft magnetic granular material Co–Fe–Hf–O for micromagnetic device applications</title><source>American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list)</source><creator>Li, Liangliang ; Crawford, Ankur M. ; Wang, Shan X. ; Marshall, Ann F. ; Mao, Ming ; Schneider, Thomas ; Bubber, Randhir</creator><creatorcontrib>Li, Liangliang ; Crawford, Ankur M. ; Wang, Shan X. ; Marshall, Ann F. ; Mao, Ming ; Schneider, Thomas ; Bubber, Randhir</creatorcontrib><description>A granular magnetic material, Co–Fe–Hf–O, has been developed-using dc pulsed magnetron reactive sputtering. The deposition rate is as high as 1.3nm∕s. The electrical and magnetic properties of Co–Fe–Hf–O film can be tuned by changing O2 during deposition. A highly resistive, magnetically soft film has been achieved in a small range of the O2∕(Ar+O2) gas flow ratio. The origin of the dependence of magnetic and electrical properties of this material is studied and explained by monitoring the evolution of the film microstructure, using x-ray diffraction and transmission electron microscopy.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/1.1853238</identifier><language>eng</language><publisher>United States</publisher><subject>ANISOTROPY ; ARGON ; COBALT COMPOUNDS ; COERCIVE FORCE ; CRYSTAL STRUCTURE ; DEPOSITION ; ELECTRIC CONDUCTIVITY ; FERROMAGNETIC MATERIALS ; GAS FLOW ; GRANULAR MATERIALS ; HAFNIUM COMPOUNDS ; HYSTERESIS ; IRON COMPOUNDS ; MAGNETIC PROPERTIES ; MATERIALS SCIENCE ; MICROSTRUCTURE ; OXYGEN ; SPUTTERING ; THIN FILMS ; TRANSMISSION ELECTRON MICROSCOPY ; X-RAY DIFFRACTION</subject><ispartof>Journal of applied physics, 2005-05, Vol.97 (10)</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c257t-58ccfdd12b29666360efed1b6d0b5bc7e547fdc7376faa6e39c9e0c109fa149e3</citedby><cites>FETCH-LOGICAL-c257t-58ccfdd12b29666360efed1b6d0b5bc7e547fdc7376faa6e39c9e0c109fa149e3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,314,780,784,885,27924,27925</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/20711622$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Li, Liangliang</creatorcontrib><creatorcontrib>Crawford, Ankur M.</creatorcontrib><creatorcontrib>Wang, Shan X.</creatorcontrib><creatorcontrib>Marshall, Ann F.</creatorcontrib><creatorcontrib>Mao, Ming</creatorcontrib><creatorcontrib>Schneider, Thomas</creatorcontrib><creatorcontrib>Bubber, Randhir</creatorcontrib><title>Soft magnetic granular material Co–Fe–Hf–O for micromagnetic device applications</title><title>Journal of applied physics</title><description>A granular magnetic material, Co–Fe–Hf–O, has been developed-using dc pulsed magnetron reactive sputtering. The deposition rate is as high as 1.3nm∕s. The electrical and magnetic properties of Co–Fe–Hf–O film can be tuned by changing O2 during deposition. A highly resistive, magnetically soft film has been achieved in a small range of the O2∕(Ar+O2) gas flow ratio. The origin of the dependence of magnetic and electrical properties of this material is studied and explained by monitoring the evolution of the film microstructure, using x-ray diffraction and transmission electron microscopy.</description><subject>ANISOTROPY</subject><subject>ARGON</subject><subject>COBALT COMPOUNDS</subject><subject>COERCIVE FORCE</subject><subject>CRYSTAL STRUCTURE</subject><subject>DEPOSITION</subject><subject>ELECTRIC CONDUCTIVITY</subject><subject>FERROMAGNETIC MATERIALS</subject><subject>GAS FLOW</subject><subject>GRANULAR MATERIALS</subject><subject>HAFNIUM COMPOUNDS</subject><subject>HYSTERESIS</subject><subject>IRON COMPOUNDS</subject><subject>MAGNETIC PROPERTIES</subject><subject>MATERIALS SCIENCE</subject><subject>MICROSTRUCTURE</subject><subject>OXYGEN</subject><subject>SPUTTERING</subject><subject>THIN FILMS</subject><subject>TRANSMISSION ELECTRON MICROSCOPY</subject><subject>X-RAY DIFFRACTION</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNo9kM9KAzEQxoMouFYPvsGCJw9bM0k32RylWCsUevDPdcnOTmpku1uSKHjzHXxDn8SVFi_fB_P9Zhg-xi6BT4EreQNTqEopZHXEMuCVKXRZ8mOWcS6gqIw2p-wsxjfOASppMvbyOLiUb-2mp-Qx3wTbv3c2jJNEwdsunw8_X98LGmXpRlnnbhhTj2H4X2rpwyPldrfrPNrkhz6esxNnu0gXB5-w58Xd03xZrNb3D_PbVYGi1KkoK0TXtiAaYZRSUnFy1EKjWt6UDWoqZ9q1qKVWzlpF0qAhjsCNszAzJCfsan93iMnXEX0ifMWh7wlTLbgGUEKM1PWeGr-OMZCrd8Fvbfisgdd_tdVQH2qTv11YYsE</recordid><startdate>20050515</startdate><enddate>20050515</enddate><creator>Li, Liangliang</creator><creator>Crawford, Ankur M.</creator><creator>Wang, Shan X.</creator><creator>Marshall, Ann F.</creator><creator>Mao, Ming</creator><creator>Schneider, Thomas</creator><creator>Bubber, Randhir</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>20050515</creationdate><title>Soft magnetic granular material Co–Fe–Hf–O for micromagnetic device applications</title><author>Li, Liangliang ; Crawford, Ankur M. ; Wang, Shan X. ; Marshall, Ann F. ; Mao, Ming ; Schneider, Thomas ; Bubber, Randhir</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c257t-58ccfdd12b29666360efed1b6d0b5bc7e547fdc7376faa6e39c9e0c109fa149e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>ANISOTROPY</topic><topic>ARGON</topic><topic>COBALT COMPOUNDS</topic><topic>COERCIVE FORCE</topic><topic>CRYSTAL STRUCTURE</topic><topic>DEPOSITION</topic><topic>ELECTRIC CONDUCTIVITY</topic><topic>FERROMAGNETIC MATERIALS</topic><topic>GAS FLOW</topic><topic>GRANULAR MATERIALS</topic><topic>HAFNIUM COMPOUNDS</topic><topic>HYSTERESIS</topic><topic>IRON COMPOUNDS</topic><topic>MAGNETIC PROPERTIES</topic><topic>MATERIALS SCIENCE</topic><topic>MICROSTRUCTURE</topic><topic>OXYGEN</topic><topic>SPUTTERING</topic><topic>THIN FILMS</topic><topic>TRANSMISSION ELECTRON MICROSCOPY</topic><topic>X-RAY DIFFRACTION</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Li, Liangliang</creatorcontrib><creatorcontrib>Crawford, Ankur M.</creatorcontrib><creatorcontrib>Wang, Shan X.</creatorcontrib><creatorcontrib>Marshall, Ann F.</creatorcontrib><creatorcontrib>Mao, Ming</creatorcontrib><creatorcontrib>Schneider, Thomas</creatorcontrib><creatorcontrib>Bubber, Randhir</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Li, Liangliang</au><au>Crawford, Ankur M.</au><au>Wang, Shan X.</au><au>Marshall, Ann F.</au><au>Mao, Ming</au><au>Schneider, Thomas</au><au>Bubber, Randhir</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Soft magnetic granular material Co–Fe–Hf–O for micromagnetic device applications</atitle><jtitle>Journal of applied physics</jtitle><date>2005-05-15</date><risdate>2005</risdate><volume>97</volume><issue>10</issue><issn>0021-8979</issn><eissn>1089-7550</eissn><abstract>A granular magnetic material, Co–Fe–Hf–O, has been developed-using dc pulsed magnetron reactive sputtering. The deposition rate is as high as 1.3nm∕s. The electrical and magnetic properties of Co–Fe–Hf–O film can be tuned by changing O2 during deposition. A highly resistive, magnetically soft film has been achieved in a small range of the O2∕(Ar+O2) gas flow ratio. The origin of the dependence of magnetic and electrical properties of this material is studied and explained by monitoring the evolution of the film microstructure, using x-ray diffraction and transmission electron microscopy.</abstract><cop>United States</cop><doi>10.1063/1.1853238</doi></addata></record> |
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source | American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list) |
subjects | ANISOTROPY ARGON COBALT COMPOUNDS COERCIVE FORCE CRYSTAL STRUCTURE DEPOSITION ELECTRIC CONDUCTIVITY FERROMAGNETIC MATERIALS GAS FLOW GRANULAR MATERIALS HAFNIUM COMPOUNDS HYSTERESIS IRON COMPOUNDS MAGNETIC PROPERTIES MATERIALS SCIENCE MICROSTRUCTURE OXYGEN SPUTTERING THIN FILMS TRANSMISSION ELECTRON MICROSCOPY X-RAY DIFFRACTION |
title | Soft magnetic granular material Co–Fe–Hf–O for micromagnetic device applications |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T09%3A43%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref_osti_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Soft%20magnetic%20granular%20material%20Co%E2%80%93Fe%E2%80%93Hf%E2%80%93O%20for%20micromagnetic%20device%20applications&rft.jtitle=Journal%20of%20applied%20physics&rft.au=Li,%20Liangliang&rft.date=2005-05-15&rft.volume=97&rft.issue=10&rft.issn=0021-8979&rft.eissn=1089-7550&rft_id=info:doi/10.1063/1.1853238&rft_dat=%3Ccrossref_osti_%3E10_1063_1_1853238%3C/crossref_osti_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c257t-58ccfdd12b29666360efed1b6d0b5bc7e547fdc7376faa6e39c9e0c109fa149e3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |