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Soft magnetic granular material Co–Fe–Hf–O for micromagnetic device applications

A granular magnetic material, Co–Fe–Hf–O, has been developed-using dc pulsed magnetron reactive sputtering. The deposition rate is as high as 1.3nm∕s. The electrical and magnetic properties of Co–Fe–Hf–O film can be tuned by changing O2 during deposition. A highly resistive, magnetically soft film h...

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Published in:Journal of applied physics 2005-05, Vol.97 (10)
Main Authors: Li, Liangliang, Crawford, Ankur M., Wang, Shan X., Marshall, Ann F., Mao, Ming, Schneider, Thomas, Bubber, Randhir
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Language:English
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cited_by cdi_FETCH-LOGICAL-c257t-58ccfdd12b29666360efed1b6d0b5bc7e547fdc7376faa6e39c9e0c109fa149e3
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container_issue 10
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container_title Journal of applied physics
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creator Li, Liangliang
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description A granular magnetic material, Co–Fe–Hf–O, has been developed-using dc pulsed magnetron reactive sputtering. The deposition rate is as high as 1.3nm∕s. The electrical and magnetic properties of Co–Fe–Hf–O film can be tuned by changing O2 during deposition. A highly resistive, magnetically soft film has been achieved in a small range of the O2∕(Ar+O2) gas flow ratio. The origin of the dependence of magnetic and electrical properties of this material is studied and explained by monitoring the evolution of the film microstructure, using x-ray diffraction and transmission electron microscopy.
doi_str_mv 10.1063/1.1853238
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issn 0021-8979
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source American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list)
subjects ANISOTROPY
ARGON
COBALT COMPOUNDS
COERCIVE FORCE
CRYSTAL STRUCTURE
DEPOSITION
ELECTRIC CONDUCTIVITY
FERROMAGNETIC MATERIALS
GAS FLOW
GRANULAR MATERIALS
HAFNIUM COMPOUNDS
HYSTERESIS
IRON COMPOUNDS
MAGNETIC PROPERTIES
MATERIALS SCIENCE
MICROSTRUCTURE
OXYGEN
SPUTTERING
THIN FILMS
TRANSMISSION ELECTRON MICROSCOPY
X-RAY DIFFRACTION
title Soft magnetic granular material Co–Fe–Hf–O for micromagnetic device applications
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