Prediction of ceramic stereolithography resin sensitivity from theory and measurement of diffusive photon transport

A general, quantitative relationship between the photon-transport mean free path (l*) and resin sensitivity (DP) in multiple-scattering alumina/monomer suspensions formulated for ceramic stereolithography is presented and experimentally demonstrated. A Mie-theory-based computational method with stru...

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Bibliographic Details
Published in:Journal of applied physics 2005-07, Vol.98 (2)
Main Authors: Wu, K. C., Seefeldt, K. F., Solomon, M. J., Halloran, J. W.
Format: Article
Language:English
Subjects:
ALUMINIUM OXIDES
CALCULATION METHODS
CERAMICS
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
EXPERIMENTAL DATA
MEAN FREE PATH
MONOMERS
MULTIPLE SCATTERING
PHOTON TRANSPORT
POLYSTYRENE
RESINS
SENSITIVITY
STRUCTURE FACTORS
SUSPENSIONS
WATER
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Summary:A general, quantitative relationship between the photon-transport mean free path (l*) and resin sensitivity (DP) in multiple-scattering alumina/monomer suspensions formulated for ceramic stereolithography is presented and experimentally demonstrated. A Mie-theory-based computational method with structure factor contributions to determine l* was developed. Planar-source diffuse transmittance experiments were performed on monodisperse and bimodal polystyrene/water and alumina/monomer systems to validate this computational tool. The experimental data support the application of this l* calculation method to concentrated suspensions composed of nonaggregating particles of moderately aspherical shape and log-normal size distribution. The values of DP are shown to be approximately five times that of l* in the tested ceramic stereolithography suspensions.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.1980531