RF Power Coupling And Plasma Transport Effects In Magnetized Capacitive Discharges

Static magnetic fields have been used to expand the operational envelope, increase power efficiency, and control processing parameters in capacitively-coupled radio frequency plasma discharges. A simple physical model has been developed to investigate the roles of the plasma dielectric tensor and pl...

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Bibliographic Details
Main Authors: Ryan, P.M., Carter, M.D., Hoffman, D.J.
Format: Conference Proceeding
Language:English
Subjects:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
CONTROL
COUPLING
DIELECTRIC TENSOR
DIFFUSION
EFFICIENCY
ELECTRIC POTENTIAL
ELECTRON MOBILITY
HIGH-FREQUENCY DISCHARGES
IONS
M CODES
MAGNETIC FIELDS
MHZ RANGE
ORIENTATION
PLASMA
PLASMA DENSITY
PLASMA PRODUCTION
RADIOWAVE RADIATION
TRANSPORT THEORY
TWO-DIMENSIONAL CALCULATIONS
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Summary:Static magnetic fields have been used to expand the operational envelope, increase power efficiency, and control processing parameters in capacitively-coupled radio frequency plasma discharges. A simple physical model has been developed to investigate the roles of the plasma dielectric tensor and plasma transport in determining the ion flux spatial profile along a wafer surface over a range of plasma density, neutral pressure and magnetic field strength and orientation. The model has been incorporated into the MORRFIC code and calculations have been made for a capacitively-coupled 300-mm etch tool operating at frequencies greater than 100 MHz. A Lieberman sheath model show effects that can occur when the sheath voltages are made to be consistent with the driven RF fields in the collisional unmagnetized limit; other sheath models will also be considered. A two-dimensional transport model accounts for magnetized cross-field diffusion. Results isolate magnetic field effects that are caused by modification of the plasma dielectric from transport effects that are caused by the reduced electron mobility perpendicular to the magnetic field.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.2098528