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Thin film deposition on powder surfaces using atmospheric pressure discharge

The deposition of SiOx containing films on NaCl and KBr particles in dielectric barrier discharge under atmospheric pressure was investigated. As precursor hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) in argon-oxygen gas mixtures were used. The deposited layers were studied by means of...

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Main Authors:	Brueser, V., Haehnel, M., Kersten, H.
Format:	Conference Proceeding
Language:	English
Subjects:	70 PLASMA PHYSICS AND FUSION TECHNOLOGY ARGON ATMOSPHERIC PRESSURE CARBON DEPOSITION DIELECTRIC MATERIALS ELECTRIC DISCHARGES MIXTURES OXYGEN OXYGEN COMPOUNDS PARTICLES PLASMA POTASSIUM BROMIDES POWDERS PRECURSOR SCANNING ELECTRON MICROSCOPY SILICON COMPOUNDS SODIUM CHLORIDES SURFACES THIN FILMS X-RAY PHOTOELECTRON SPECTROSCOPY
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creator	Brueser, V. Haehnel, M. Kersten, H.
description	The deposition of SiOx containing films on NaCl and KBr particles in dielectric barrier discharge under atmospheric pressure was investigated. As precursor hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) in argon-oxygen gas mixtures were used. The deposited layers were studied by means of light microscopy, SEM and XPS investigations. The particles could be completely covered by SiOx. With increasing oxygen content in the coating the carbon content decreases.
doi_str_mv	10.1063/1.2134635
format	conference_proceeding
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As precursor hexamethyldisiloxane (HMDSO) and tetraethoxysilane (TEOS) in argon-oxygen gas mixtures were used. The deposited layers were studied by means of light microscopy, SEM and XPS investigations. The particles could be completely covered by SiOx. With increasing oxygen content in the coating the carbon content decreases.</abstract><cop>United States</cop><doi>10.1063/1.2134635</doi></addata></record>
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identifier	ISSN: 0094-243X
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language	eng
recordid	cdi_osti_scitechconnect_20726784
source	American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list)
subjects	70 PLASMA PHYSICS AND FUSION TECHNOLOGY ARGON ATMOSPHERIC PRESSURE CARBON DEPOSITION DIELECTRIC MATERIALS ELECTRIC DISCHARGES MIXTURES OXYGEN OXYGEN COMPOUNDS PARTICLES PLASMA POTASSIUM BROMIDES POWDERS PRECURSOR SCANNING ELECTRON MICROSCOPY SILICON COMPOUNDS SODIUM CHLORIDES SURFACES THIN FILMS X-RAY PHOTOELECTRON SPECTROSCOPY
title	Thin film deposition on powder surfaces using atmospheric pressure discharge
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