Time-resolved measurements of Cl{sub 2} density in high-density plasmas and application

Absorption at 355 nm, with a pulsed frequency tripled yttrium-aluminum-garnet laser as light source, is used to monitor the time evolution of the Cl{sub 2} density in high-density inductively coupled plasmas. The detection limit over a 0.1 s acquisition time is about 0.2 mTorr of Cl{sub 2}. This tec...

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Bibliographic Details
Published in:Applied physics letters 2006-01, Vol.88 (5)
Main Authors: Cunge, Gilles, Mori, Masahito, Kogelschatz, Martin, Sadeghi, Nader, Laboratoire de Spectrometrie Physique, CNRS-UJF, Boite Postale 87, 38402 Saint Martin d'Heres
Format: Article
Language:English
Subjects:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ABSORPTION
CHLORINE
DENSITY
ETCHING
EVOLUTION
LIGHT SOURCES
LIGHT TRANSMISSION
MONITORING
PLASMA
PLASMA DENSITY
PLASMA DIAGNOSTICS
SENSITIVITY
SOLID STATE LASERS
TIME RESOLUTION
WALL EFFECTS
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Summary:Absorption at 355 nm, with a pulsed frequency tripled yttrium-aluminum-garnet laser as light source, is used to monitor the time evolution of the Cl{sub 2} density in high-density inductively coupled plasmas. The detection limit over a 0.1 s acquisition time is about 0.2 mTorr of Cl{sub 2}. This technique is well suited for monitoring chlorine density when studying elementary processes in Cl{sub 2} containing plasmas. Furthermore, it can be applied to control the process drift in industrial etch reactors resulting from the modification of the chamber walls conditions: by measuring the Cl{sub 2} density in a reference Cl{sub 2} plasma before etching a wafer, it can be determined if the chamber wall conditions are kept identical from one wafer to another.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2171768