Propulsion of Ripples on Glass by Ion Bombardment

The propulsion of surface ripples on SiO{sub 2} by an ion beam was investigated by in situ electron microscopy. The observed propagation of the ripples contradicts existing models for ion-beam-induced ripple development. A new model based on the Navier-Stokes relations for viscous flow in a thin lay...

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Bibliographic Details
Published in:Physical review letters 2006-03, Vol.96 (10)
Main Author: Alkemade, P.F.A.
Format: Article
Language:English
Subjects:
DEPOSITION
GLASS
ION BEAMS
MATERIALS SCIENCE
NANOSTRUCTURES
NAVIER-STOKES EQUATIONS
PROPULSION
SCANNING ELECTRON MICROSCOPY
SILICON OXIDES
THIN FILMS
VISCOUS FLOW
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Summary:The propulsion of surface ripples on SiO{sub 2} by an ion beam was investigated by in situ electron microscopy. The observed propagation of the ripples contradicts existing models for ion-beam-induced ripple development. A new model based on the Navier-Stokes relations for viscous flow in a thin layer is introduced. It includes inhomogeneous viscous flow, driven by spatial variations in the deposition of the energy of the ion beam. The model explains the observed reversed propagation. The hitherto unknown propulsion mechanism is important for understanding nanoscale pattern formation by ion bombardment.
ISSN:0031-9007
1079-7114
DOI:10.1103/PHYSREVLETT.96.1