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Cooperative solid-vapor-phase epitaxy: An approach for fabrication of single-crystalline insulator/Si/insulator nanostructures
We study the growth of insulator/Si/insulator nanostructures on Si(111) using molecular beam epitaxy. Based on different investigations, we develop an approach for the fabrication of a nanostructure with a continuous ultrathin single-crystalline silicon buried in a single-crystalline insulator matri...
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Published in: | Applied physics letters 2006-04, Vol.88 (15) |
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creator | Fissel, A. Kühne, D. Bugiel, E. Osten, H. J. |
description | We study the growth of insulator/Si/insulator nanostructures on Si(111) using molecular beam epitaxy. Based on different investigations, we develop an approach for the fabrication of a nanostructure with a continuous ultrathin single-crystalline silicon buried in a single-crystalline insulator matrix with sharp interfaces. This approach is based on an epitaxial encapsulated solid-phase epitaxy, in which the solid-phase epitaxy of silicon is accompanied by a vapor-phase epitaxy of the second insulator layer. We call this approach as cooperative solid-vapor-phase epitaxy. As an example we demonstrate the growth of buried epitaxial silicon in epitaxial Gd2O3. |
doi_str_mv | 10.1063/1.2192979 |
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source | American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list); AIP_美国物理联合会现刊(与NSTL共建) |
subjects | CRYSTAL GROWTH FABRICATION GADOLINIUM OXIDES INTERFACES LAYERS MATERIALS SCIENCE MOLECULAR BEAM EPITAXY MONOCRYSTALS NANOSTRUCTURES SEMICONDUCTOR MATERIALS SILICON VAPOR PHASE EPITAXY |
title | Cooperative solid-vapor-phase epitaxy: An approach for fabrication of single-crystalline insulator/Si/insulator nanostructures |
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