Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques

We have developed and tested a new method of fabricating nanogaps using a combination of self-assembled molecular and electron beam lithographic techniques. The method enables us to control the gap size with an accuracy of approximately 2 nm and designate the positions where the nanogaps should be f...

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Bibliographic Details
Published in:Applied physics letters 2006-05, Vol.88 (22), p.223111-223111-3
Main Authors: Negishi, R., Hasegawa, T., Terabe, K., Aono, M., Ebihara, T., Tanaka, H., Ogawa, T.
Format: Article
Language:English
Subjects:
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
ELECTRON BEAMS
ELECTRONS
FABRICATION
GOLD
MATERIALS SCIENCE
NANOSTRUCTURES
PARTICLES
TUNNEL EFFECT
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Summary:We have developed and tested a new method of fabricating nanogaps using a combination of self-assembled molecular and electron beam lithographic techniques. The method enables us to control the gap size with an accuracy of approximately 2 nm and designate the positions where the nanogaps should be formed with high-resolution patterning by using electron beam lithography. We have demonstrated the utility of the fabricated nanogaps by measuring a single electron tunneling phenomenon through dodecanethiol-coated Au nanoparticles placed in the fabricated nanogap.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2209208