Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques

We have developed and tested a new method of fabricating nanogaps using a combination of self-assembled molecular and electron beam lithographic techniques. The method enables us to control the gap size with an accuracy of approximately 2 nm and designate the positions where the nanogaps should be f...

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Published in:Applied physics letters 2006-05, Vol.88 (22), p.223111-223111-3
Main Authors: Negishi, R., Hasegawa, T., Terabe, K., Aono, M., Ebihara, T., Tanaka, H., Ogawa, T.
Format: Article
Language:English
Subjects:
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
ELECTRON BEAMS
ELECTRONS
FABRICATION
GOLD
MATERIALS SCIENCE
NANOSTRUCTURES
PARTICLES
TUNNEL EFFECT
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cited_by cdi_FETCH-LOGICAL-c457t-8a8bab5047866140c23481fc1be6bf13d770fc6b162b1f209d6eec14442a8a053
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container_end_page 223111-3
container_issue 22
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container_title Applied physics letters
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creator Negishi, R.
Hasegawa, T.
Terabe, K.
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description We have developed and tested a new method of fabricating nanogaps using a combination of self-assembled molecular and electron beam lithographic techniques. The method enables us to control the gap size with an accuracy of approximately 2 nm and designate the positions where the nanogaps should be formed with high-resolution patterning by using electron beam lithography. We have demonstrated the utility of the fabricated nanogaps by measuring a single electron tunneling phenomenon through dodecanethiol-coated Au nanoparticles placed in the fabricated nanogap.
doi_str_mv 10.1063/1.2209208
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source American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list); AIP_美国物理联合会现刊（与NSTL共建）
subjects CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
ELECTRON BEAMS
ELECTRONS
FABRICATION
GOLD
MATERIALS SCIENCE
NANOSTRUCTURES
PARTICLES
TUNNEL EFFECT
title Fabrication of nanoscale gaps using a combination of self-assembled molecular and electron beam lithographic techniques
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