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In situ energy dispersive x-ray reflectometry to investigate the (RuPc){sub 2}/NO{sub x} interaction process evidenced by ex situ measurements

A systematic energy dispersive x-ray reflectometry study of different ruthenium phthalocyanine (RuPc){sub 2} thin films was performed in order to investigate their reactivity with the oxidizing NO{sub x} gas. A preliminary ex situ analysis, consisting of the comparison between the morphological para...

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Bibliographic Details
Published in:Journal of applied physics 2006-02, Vol.99 (4)
Main Authors: Generosi, Amanda, Paci, Barbara, Rossi Albertini, Valerio, Perfetti, Paolo, Paoletti, Anna M., Pennesi, Gianna, Rossi, Gentilina, Caminiti, Ruggero, Istituto di Struttura della Materia-Area di Ricerca di Montelibretti, Via Salaria Km. 29.5, Casclla Portale 10 Monterotondo Stazione, I-00016 Rome, Dipartimento di Chimica, Universita ''La Sapienza'' di Roma e sezione INFM, Piazale Aldo Moro 5, 00185 Rome
Format: Article
Language:English
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Summary:A systematic energy dispersive x-ray reflectometry study of different ruthenium phthalocyanine (RuPc){sub 2} thin films was performed in order to investigate their reactivity with the oxidizing NO{sub x} gas. A preliminary ex situ analysis, consisting of the comparison between the morphological parameters of different films (before and after the exposure to the gas), was performed. It suggests that a reaction involving two different mechanisms takes place. The following in situ (while fluxing the gas) reflectometry analysis confirms this hypothesis, and clarifies the temporal evolution, also revealing that the first mechanism is limited to the film surface, while the second is a bulk diffusion process.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.2171778