Rapid nanopatterning of a Zr-based metallic glass surface utilizing focused ion beam induced selective etching

A simple and rapid method is proposed for nanoscale patterning on a metallic glass surface using focused ion beam irradiation followed by wet etching. It was found that the etch rate of a metallic glass surface irradiated with Ga + ions could be drastically changed, and rapid patterning was possible...

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Bibliographic Details
Published in:Applied physics letters 2006-10, Vol.89 (14), p.143115-143115-3
Main Authors: Kawasegi, Noritaka, Morita, Noboru, Yamada, Shigeru, Takano, Noboru, Oyama, Tatsuo, Ashida, Kiwamu, Taniguchi, Jun, Miyamoto, Iwao, Momota, Sadao, Ofune, Hitoshi
Format: Article
Language:English
Subjects:
ALUMINIUM ALLOYS
AMORPHOUS STATE
ARGON IONS
COPPER ALLOYS
CRYSTALLOGRAPHY
ETCHING
GALLIUM IONS
ION BEAMS
ION IMPLANTATION
MATERIALS SCIENCE
METALLIC GLASSES
NANOSTRUCTURES
NICKEL ALLOYS
SUBSTRATES
TRANSMISSION ELECTRON MICROSCOPY
ZIRCONIUM ALLOYS
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Summary:A simple and rapid method is proposed for nanoscale patterning on a metallic glass surface using focused ion beam irradiation followed by wet etching. It was found that the etch rate of a metallic glass surface irradiated with Ga + ions could be drastically changed, and rapid patterning was possible with this method. Cross-sectional transmission electron microscopy observation reveals that the metallic glass substrate maintains an amorphous phase following irradiation. Etching enhancement was not observed for irradiation with Ar + ions. The results indicate that enhancement of etching results from the presence of implanted Ga + ions rather than a change in crystallography.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2360181