Efficient focusing of hard x rays to 25 nm by a total reflection mirror

Nanofocused x rays are indispensable because they can provide high spatial resolution and high sensitivity for x-ray nanoscopy/spectroscopy. A focusing system using total reflection mirrors is one of the most promising methods for producing nanofocused x rays due to its high efficiency and energy-tu...

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Bibliographic Details
Published in:Applied physics letters 2007-01, Vol.90 (5), p.051903-051903-3
Main Authors: Mimura, Hidekazu, Yumoto, Hirokatsu, Matsuyama, Satoshi, Sano, Yasuhisa, Yamamura, Kazuya, Mori, Yuzo, Yabashi, Makina, Nishino, Yoshinori, Tamasaku, Kenji, Ishikawa, Tetsuya, Yamauchi, Kazuto
Format: Article
Language:English
Subjects:
BEAM PROFILES
EFFICIENCY
FABRICATION
FOCUSING
HARD X RADIATION
INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
INTERFEROMETRY
KEV RANGE 10-100
MIRRORS
NANOSTRUCTURES
REFLECTION
SPATIAL RESOLUTION
SPECTROSCOPY
SPRING-8 STORAGE RING
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Summary:Nanofocused x rays are indispensable because they can provide high spatial resolution and high sensitivity for x-ray nanoscopy/spectroscopy. A focusing system using total reflection mirrors is one of the most promising methods for producing nanofocused x rays due to its high efficiency and energy-tunable focusing. The authors have developed a fabrication system for hard x-ray mirrors by developing elastic emission machining, microstitching interferometry, and relative angle determinable stitching interferometry. By using an ultraprecisely figured mirror, they realized hard x-ray line focusing with a beam width of 25 nm at 15 keV . The focusing test was performed at the 1 - km -long beamline of SPring-8.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2436469