Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing

The variation in plasma uniformity over an extremely large size inductively coupled plasma (ICP) source of 2750×2350mm2 was examined. An internal linear-type antenna called “double comb-type antenna” was used as the ICP source. A plasma density of ∼1.4×1011∕cm3 could be obtained at 5mTorr Ar by appl...

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Bibliographic Details
Published in:Applied physics letters 2008-02, Vol.92 (5)
Main Authors: Lim, Jong Hyeuk, Kim, Kyong Nam, Park, Jung Kyun, Lim, Jong Tae, Yeom, Geun Young
Format: Article
Language:English
Subjects:
ANTENNAS
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
DISPLAY DEVICES
MHZ RANGE 01-100
PLASMA
PLASMA DENSITY
SUBSTRATES
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Summary:The variation in plasma uniformity over an extremely large size inductively coupled plasma (ICP) source of 2750×2350mm2 was examined. An internal linear-type antenna called “double comb-type antenna” was used as the ICP source. A plasma density of ∼1.4×1011∕cm3 could be obtained at 5mTorr Ar by applying 10kW rf power to the source at a frequency of 13.56MHz. An increase in rf power from 1to10kW improved the plasma uniformity over a substrate area of 2300×2000mm2 from 18.1% to 11.4%. The improvement in uniformity of the internal ICP source was attributed to the increase in plasma density near the wall.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2840997