Ultra Low-{kappa} Metrology Using X-Ray Reflectivity And Small-Angle X-Ray Scattering Techniques

The automated metrology tool, combining X-ray reflectivity XRR and small-angle X-ray scattering SAXS has been demonstrated as a capable equipment to assess standard porous Ultra low-{kappa} (ULK) metrology. Therefore those techniques have enabled characterizations of several ULK used in sub-65 nm no...

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Bibliographic Details
Published in:AIP conference proceedings 2007-09, Vol.931 (1)
Main Authors: Plantier, L., Gonchond, J.-P., Pernot, F., Peled, A., Yokhin, B., Wyon, C., Royer, J.-C.
Format: Article
Language:English
Subjects:
MATERIALS SCIENCE
POROUS MATERIALS
REFLECTION
REFLECTIVITY
SMALL ANGLE SCATTERING
X-RAY DIFFRACTION
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Summary:The automated metrology tool, combining X-ray reflectivity XRR and small-angle X-ray scattering SAXS has been demonstrated as a capable equipment to assess standard porous Ultra low-{kappa} (ULK) metrology. Therefore those techniques have enabled characterizations of several ULK used in sub-65 nm nodes integration. Standard ULK material for 65 nm node technology has been monitored through the whole C065 integration steps using those combined techniques.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.2799395