X-ray-based Micro/Nanomanufacturing at SSLS - Technology and Applications

Deep and high-aspect-ratio micro/nanostructures can be accurately patterned in a variety of resists by proximity lithography using high energy, intense, parallel beams of X-rays from synchrotron radiation sources. Using so called LIGA technology, high-aspect-ratio micro/nanostructures can be produce...

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Bibliographic Details
Main Authors: Jian, L K, Casse, B D F, Heussler, S P, Kong, J R, Moser, H O, Ren, Y P, Saw, B T, Mahmood, Shahrain bin
Format: Conference Proceeding
Language:English
Subjects:
ASPECT RATIO
COMPOSITE MATERIALS
FOCUSING
FOUNDRIES
MASKING
NANOSTRUCTURES
PARTICLE ACCELERATORS
SYNCHROTRON RADIATION
SYNCHROTRON RADIATION SOURCES
X RADIATION
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Summary:Deep and high-aspect-ratio micro/nanostructures can be accurately patterned in a variety of resists by proximity lithography using high energy, intense, parallel beams of X-rays from synchrotron radiation sources. Using so called LIGA technology, high-aspect-ratio micro/nanostructures can be produced with vertical dimensions ranging from micrometers to millimeters and horizontal dimensions as small as microns. SSLS has set up its LiMiNT facility (Lithography for Micro/Nanotechnology) and is running it partly as a foundry, partly as a research lab. Under the foundry aspect, work is done for customers in various fields of applications. SSLS' own research is focusing on the development of devices and artificial composite materials such as electromagnetic metamaterials. In this paper, the technology capabilities of the LiMiNT facility and application examples are presented.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.2436352