Production of High Density Polarized Electron Beam from GaAs-GaAsP Superlattice Photocathode

Future high energy accelerators require polarized electron sources that can generate high bunch charge and/or high density electron beam with low emittance. Various superlattice photocathodes and a high voltage load-lock DC gun have been developed at Nagoya University for this purpose. Using a GaAs-...

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Bibliographic Details
Published in:AIP conference proceedings 2007-01, Vol.915 (1), p.1025-1030
Main Authors: Yamamoto, M, Yamamoto, N, Okumi, S, Sakai, R, Kuwahara, M, Morino, T, Tamagaki, K, Mano, A, Utsu, A, Nakanishi, T, Bo, C, Ujihara, T, Takeda, Y, Kuriki, M
Format: Article
Language:English
Subjects:
BEAM BUNCHING
BEAM EXTRACTION
DENSITY
ELECTRIC POTENTIAL
ELECTRON BEAMS
ELECTRON DENSITY
ELECTRON GUNS
ELECTRON SOURCES
GALLIUM ARSENIDES
PARTICLE ACCELERATORS
PHOTOCATHODES
POLARIZATION
SEMICONDUCTOR DEVICES
SEMICONDUCTOR MATERIALS
SUPERLATTICES
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Summary:Future high energy accelerators require polarized electron sources that can generate high bunch charge and/or high density electron beam with low emittance. Various superlattice photocathodes and a high voltage load-lock DC gun have been developed at Nagoya University for this purpose. Using a GaAs-GaAsP strained superlattice photocathode, the bunch charge of 8nC was extracted in a 1.6ns bunch with a 20 mm diameter, and that of 3.3pC in ~30ps bunch with 1.2mm diameter.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.2750947