Hydrogen plasma and atomic oxygen treatments of diamond: Chemical versus morphological effects

Chemical bonding and morphology of chemical vapor deposited diamond films were studied using high resolution electron energy loss spectroscopy and atomic force microscopy, following hydrogen plasma and atomic oxygen exposures. The hydrogen plasma exposure resulted in preferential etching of nondiamo...

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Bibliographic Details
Published in:Applied physics letters 2008-06, Vol.92 (23), p.234103-234103-3
Main Authors: Shpilman, Z., Gouzman, I., Grossman, E., Akhvlediani, R., Hoffman, A.
Format: Article
Language:English
Subjects:
ATOMIC FORCE MICROSCOPY
CHEMICAL BONDS
CHEMICAL VAPOR DEPOSITION
DIAMONDS
ELECTRONS
ENERGY-LOSS SPECTROSCOPY
ETCHING
HYDROCARBONS
HYDROGEN
LAYERS
MATERIALS SCIENCE
MORPHOLOGY
OXYGEN
PLASMA
SURFACES
THIN FILMS
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Summary:Chemical bonding and morphology of chemical vapor deposited diamond films were studied using high resolution electron energy loss spectroscopy and atomic force microscopy, following hydrogen plasma and atomic oxygen exposures. The hydrogen plasma exposure resulted in preferential etching of nondiamond carbon phases, selective etching of diamond facets, and termination of the diamond surfaces by s p 3 - C - H species. Exposure to atomic oxygen, on the other hand, produced significant chemical changes resulting in oxidized hydrocarbon ill defined top layer, while the morphology of the surface remained almost unchanged.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2939561