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Hydrogen plasma and atomic oxygen treatments of diamond: Chemical versus morphological effects
Chemical bonding and morphology of chemical vapor deposited diamond films were studied using high resolution electron energy loss spectroscopy and atomic force microscopy, following hydrogen plasma and atomic oxygen exposures. The hydrogen plasma exposure resulted in preferential etching of nondiamo...
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| Published in: | Applied physics letters 2008-06, Vol.92 (23), p.234103-234103-3 |
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| Main Authors: | , , , , |
| Format: | Article |
| Language: | English |
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| cited_by | cdi_FETCH-LOGICAL-c311t-ac7acf18ce91222a32a229ee8e2b2c0d933cc321dd28dce76130d28a223529373 |
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| cites | cdi_FETCH-LOGICAL-c311t-ac7acf18ce91222a32a229ee8e2b2c0d933cc321dd28dce76130d28a223529373 |
| container_end_page | 234103-3 |
| container_issue | 23 |
| container_start_page | 234103 |
| container_title | Applied physics letters |
| container_volume | 92 |
| creator | Shpilman, Z. Gouzman, I. Grossman, E. Akhvlediani, R. Hoffman, A. |
| description | Chemical bonding and morphology of chemical vapor deposited diamond films were studied using high resolution electron energy loss spectroscopy and atomic force microscopy, following hydrogen plasma and atomic oxygen exposures. The hydrogen plasma exposure resulted in preferential etching of nondiamond carbon phases, selective etching of diamond facets, and termination of the diamond surfaces by
s
p
3
-
C
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H
species. Exposure to atomic oxygen, on the other hand, produced significant chemical changes resulting in oxidized hydrocarbon ill defined top layer, while the morphology of the surface remained almost unchanged. |
| doi_str_mv | 10.1063/1.2939561 |
| format | article |
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s
p
3
-
C
-
H
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s
p
3
-
C
-
H
species. Exposure to atomic oxygen, on the other hand, produced significant chemical changes resulting in oxidized hydrocarbon ill defined top layer, while the morphology of the surface remained almost unchanged.</description><subject>ATOMIC FORCE MICROSCOPY</subject><subject>CHEMICAL BONDS</subject><subject>CHEMICAL VAPOR DEPOSITION</subject><subject>DIAMONDS</subject><subject>ELECTRONS</subject><subject>ENERGY-LOSS SPECTROSCOPY</subject><subject>ETCHING</subject><subject>HYDROCARBONS</subject><subject>HYDROGEN</subject><subject>LAYERS</subject><subject>MATERIALS SCIENCE</subject><subject>MORPHOLOGY</subject><subject>OXYGEN</subject><subject>PLASMA</subject><subject>SURFACES</subject><subject>THIN FILMS</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><recordid>eNp1kEtLAzEQgIMoWKsH_0HAk4etmYR9RPAgxVqh4EWvhpjMtiu7SUmi2H9v6tajp3l9DDMfIZfAZsAqcQMzLoUsKzgiE2B1XQiA5phMGGOiqGQJp-Qsxo9cllyICXlb7mzwa3R02-s4aKqdpTr5oTPUf-_2gxRQpwFditS31HZ68M7e0vkGM6R7-oUhfkY6-LDd-N6vf5vYtmhSPCcnre4jXhzilLwuHl7my2L1_Pg0v18VJt-XCm1qbVpoDErgnGvBNecSsUH-zg2zUghjBAdreWMN1hUIltMMiTL_W4spuRr3-pg6FU2X0GyMdy4foTgAZw3ITF2PlAk-xoCt2oZu0GGngKm9PgXqoC-zdyO7X6ZT593_8J9DNTpU2aH4AZaEd5Y</recordid><startdate>20080609</startdate><enddate>20080609</enddate><creator>Shpilman, Z.</creator><creator>Gouzman, I.</creator><creator>Grossman, E.</creator><creator>Akhvlediani, R.</creator><creator>Hoffman, A.</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>OTOTI</scope></search><sort><creationdate>20080609</creationdate><title>Hydrogen plasma and atomic oxygen treatments of diamond: Chemical versus morphological effects</title><author>Shpilman, Z. ; Gouzman, I. ; Grossman, E. ; Akhvlediani, R. ; Hoffman, A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c311t-ac7acf18ce91222a32a229ee8e2b2c0d933cc321dd28dce76130d28a223529373</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><topic>ATOMIC FORCE MICROSCOPY</topic><topic>CHEMICAL BONDS</topic><topic>CHEMICAL VAPOR DEPOSITION</topic><topic>DIAMONDS</topic><topic>ELECTRONS</topic><topic>ENERGY-LOSS SPECTROSCOPY</topic><topic>ETCHING</topic><topic>HYDROCARBONS</topic><topic>HYDROGEN</topic><topic>LAYERS</topic><topic>MATERIALS SCIENCE</topic><topic>MORPHOLOGY</topic><topic>OXYGEN</topic><topic>PLASMA</topic><topic>SURFACES</topic><topic>THIN FILMS</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Shpilman, Z.</creatorcontrib><creatorcontrib>Gouzman, I.</creatorcontrib><creatorcontrib>Grossman, E.</creatorcontrib><creatorcontrib>Akhvlediani, R.</creatorcontrib><creatorcontrib>Hoffman, A.</creatorcontrib><collection>CrossRef</collection><collection>OSTI.GOV</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Shpilman, Z.</au><au>Gouzman, I.</au><au>Grossman, E.</au><au>Akhvlediani, R.</au><au>Hoffman, A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Hydrogen plasma and atomic oxygen treatments of diamond: Chemical versus morphological effects</atitle><jtitle>Applied physics letters</jtitle><date>2008-06-09</date><risdate>2008</risdate><volume>92</volume><issue>23</issue><spage>234103</spage><epage>234103-3</epage><pages>234103-234103-3</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>Chemical bonding and morphology of chemical vapor deposited diamond films were studied using high resolution electron energy loss spectroscopy and atomic force microscopy, following hydrogen plasma and atomic oxygen exposures. The hydrogen plasma exposure resulted in preferential etching of nondiamond carbon phases, selective etching of diamond facets, and termination of the diamond surfaces by
s
p
3
-
C
-
H
species. Exposure to atomic oxygen, on the other hand, produced significant chemical changes resulting in oxidized hydrocarbon ill defined top layer, while the morphology of the surface remained almost unchanged.</abstract><cop>United States</cop><pub>American Institute of Physics</pub><doi>10.1063/1.2939561</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0003-6951 |
| ispartof | Applied physics letters, 2008-06, Vol.92 (23), p.234103-234103-3 |
| issn | 0003-6951 1077-3118 |
| language | eng |
| recordid | cdi_osti_scitechconnect_21120819 |
| source | American Institute of Physics:Jisc Collections:Transitional Journals Agreement 2021-23 (Reading list); AIP - American Institute of Physics |
| subjects | ATOMIC FORCE MICROSCOPY CHEMICAL BONDS CHEMICAL VAPOR DEPOSITION DIAMONDS ELECTRONS ENERGY-LOSS SPECTROSCOPY ETCHING HYDROCARBONS HYDROGEN LAYERS MATERIALS SCIENCE MORPHOLOGY OXYGEN PLASMA SURFACES THIN FILMS |
| title | Hydrogen plasma and atomic oxygen treatments of diamond: Chemical versus morphological effects |
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