Preparation and Characterization of Ti-Zr-V Non-Evaporable Getter Films to Be Used in Ultra-High Vacuum

An appealing procedure to obtain operating pressures in the 10-8 Pa range, which is necessary for the insertion devices elements of synchrotron sources, is to coat the inner ultra-high vacuum chamber walls with a thin film of non-evaporable getter (NEG) metals. Titanium, zirconium, vanadium, and the...

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Bibliographic Details
Published in:AIP conference proceedings 2009-01, Vol.1092 (1), p.168-172
Main Authors: Ferreira, Marcelo J, Tallarico, Denise A, Nascente, Pedro A P
Format: Article
Language:English
Subjects:
ATOMIC FORCE MICROSCOPY
CHEMICAL ANALYSIS
DEPOSITS
MATERIALS SCIENCE
PRESSURE RANGE NANO PA
SCANNING ELECTRON MICROSCOPY
SILICON
SOLUBILITY
SPUTTERING
SUBSTRATES
SYNCHROTRON RADIATION SOURCES
THERMODYNAMIC ACTIVITY
THIN FILMS
TITANIUM
TITANIUM ALLOYS
VANADIUM
VANADIUM ALLOYS
X-RAY PHOTOELECTRON SPECTROSCOPY
ZIRCONIUM
ZIRCONIUM ALLOYS
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Summary:An appealing procedure to obtain operating pressures in the 10-8 Pa range, which is necessary for the insertion devices elements of synchrotron sources, is to coat the inner ultra-high vacuum chamber walls with a thin film of non-evaporable getter (NEG) metals. Titanium, zirconium, vanadium, and their alloys are used as NEG materials due to their low activation temperature, high chemical activity, large solubility, and high diffusivity for gases. In this work, magnetron sputtering was employed to deposit thin films of Ti-Zr-V on a Si(111) substrate. The morphological, structural, and chemical analyses were carried out by atomic force microscopy (AFM), scanning electron microscopy (SEM) with energy-dispersive spectroscopy (EDS), and X-ray photoelectron spectroscopy (XPS).
ISSN:0094-243X
1551-7616
DOI:10.1063/1.3086219